Preparation method of polymer film with periodic nano-structure and template used by same
A polymer film and nanostructure technology, applied in the field of polymer film preparation, can solve the problems of high cost, time-consuming, low repeatability, etc., and achieve the effects of low cost, major economic benefits, and high repeatability
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[0041] Example 1
[0042] Preparation template:
[0043] 1. Use vapor deposition method to deposit mist-like gold on a 1mm×1mm glass plate, so that the thickness of the metallographic phase is 1200nm; the height of the glass plate is 0.5mm;
[0044] 2. Use the soft X-ray of the synchronous light source to etch the metallography from the angle perpendicular to the glass plate. The etching is controlled by a program. The first ray is emitted to etch the gold bar of 150×1200nm, the ray source moves 150nm, and the second ray is emitted, and so on, the final template with a stripe width of 150nm and a stripe spacing of 150nm is obtained. The soft X-ray synchronous light source is provided by the synchronous light source of the University of Science and Technology of China.
Example Embodiment
[0045] Example 2
[0046] Select a silicon wafer of 1mm×1mm, and use the soft X-ray of the synchronous light source to etch the metallography from the angle perpendicular to the glass plate. The etching is controlled by a program. The first ray is emitted to etch a 20×1200nm silicon wafer, the ray source is moved 20nm, and the second ray is emitted, and so on, the final template with a stripe width of 20nm and a stripe spacing of 20nm is obtained. The soft X-ray synchronous light source is provided by the synchronous light source of the University of Science and Technology of China.
[0047] The templates used in the following implementations are all prepared by the method of Example 1.
Example Embodiment
[0048] Example 3 Polyethersulfone (PES) polymer membrane with periodic nanostructure (membrane 1)
[0049] Weigh 1 gram of polyethersulfone (weight average molecular weight: 800,000) (PES) powder with an electronic balance, with a particle size of 0.2 mm. Put the weighed powder into a 150ml Erlenmeyer flask, add N-methylpyrrolidone (NMP) to the total weight of the solution to 100g, then place the solution in a common oven at 60 degrees Celsius to heat and dissolve for 3 days to prepare a casting liquid (The concentration of the casting liquid is 1%). After the obtained casting liquid is allowed to stand still and degassed, 1 mL of the casting liquid is sucked with a pipette and dropped onto the silicon wafer template. At a speed of 100 rpm on a homogenizer, spin coating for 600 s at a speed of 100 rpm to form a film. The spin-coated film (together with the silicon wafer template) is placed in an ordinary oven at 60 degrees Celsius and dried to a constant weight to obtain a dry ...
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