Rectangular etching ion gun

Abstract

The invention relates to a rectangular etching ion gun which comprises a first pole shoe, a second pole shoe, a third pole shoe, a fourth pole shoe, a first magnet, a second magnet, a fourth pole shoe, a rectangular annular upper anode, a rectangular annular lower anode, a rectangular conical surface, an arc plate-shaped screen grid, an arc plate-shaped accelerating grid, a base, a cathode lamp, a lamp filament and an inflating pipe, wherein the first pole shoe, the second pole shoe, the third pole shoe and the fourth pole shoe are coaxially arranged from bottom to top; the first magnet is positioned between the end surfaces of the first pole shoe and the second pole shoe; the second magnet is positioned between the end surfaces of the second pole shoe and the third pole shoe; the fourth pole shoe is positioned on the end surface of the third pole shoe; the rectangular annular upper anode is positioned in the second magnet; the rectangular annular lower anode is positioned between the first magnet and a rectangular pipe; the rectangular conical surface with high outside and low inside is arranged on the upper end surface of the rectangular annular lower anode; the arc plate-shaped screen grid is overlapped at the upper end surface of the fourth pole shoe; the arc plate-shaped accelerating grid is suspended on the screen grid; the base is arranged in the center of the lower surface of the first pole shoe and covers an inner hole of the rectangular pipe; the cathode lamp is fixed on the base and positioned in the rectangular pipe; the lamp filament is positioned in a rectangular ring of the rectangular annular upper anode; and the inflating pipe is positioned between the rectangular pipe and the cathode lamp after penetrating through the base and communicated with an argon source. The invention has the advantages of less etching gas dosage, small size, low power consumption, even ion beam, and the like.

Description

technical field [0001] The invention belongs to ion gun equipment for etching quartz crystal, in particular to a rectangular etching ion gun. technical background: [0002] With the development of information technology, electronic components are becoming more and more miniaturized, and quartz crystals, as the key components (chips) of clocks, are also getting smaller and smaller. The quartz crystal used for the clock must be adjusted by frequency (that is, the adjustment of the thickness of the silver-plated layer of the quartz crystal) to ensure the accuracy of the clock. Generally, there are two ways to control the frequency of quartz crystals. One is to control the thickness of the silver layer of quartz crystals by vacuum evaporating the silver layer on the quartz crystals (quartz crystal frequency control). This method is suitable for large-sized quartz crystals. The binding force between the plated silver layer and the quartz crystal is tensile stress, which is relat...

AI Technical Summary

Problems solved by technology

[0005] Image 6 What is shown is the 12cm circular ion gun of the Space Science and Applied Research Center of the Chinese Academy of Sciences. The magnetic lines of force on the surface of the upper anode are divided into two sections, which increases the loss of the cathode and shortens the life of the cathode filament; in addition, because the screen grid and the acceleration grid are spherical shapes that protrude outward, they are only suitable for ion cleaning or optical ionization of materials. Auxiliary coating

[0006] Figure 7 Shown is the 8 cm circular ion gun of the Space Science and Applied Research Center of the Chinese Academy of Sciences. The screen grid and the acceleration grid are both disk-shaped grids; due to the small focusing range of the disk-shaped grid, it is impossible to etch devices with large aspect ratios ; Since there is only one upper anode; the divergent magnetic field is used, and the uniformity of the ion beam is poor

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