NiTi shape memory alloy with surface injected with metallic elements and preparation method thereof
A metal element, memory alloy technology, applied in ion implantation plating, metal material coating process, coating and other directions, can solve problems such as insufficient improvement of corrosion resistance, biocompatibility characterization of NiTi shape memory alloy, etc. To achieve the effect of easy operation, improved wear resistance and biocompatibility, and simple technical process
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[0025] A method for preparing a NiTi shape memory alloy with metal elements implanted on the surface includes the following steps:
[0026] Step 1: Pretreatment of the substrate
[0027] Select the NiTi shape memory alloy matrix with nearly equal atomic ratio, after grinding and polishing, ultrasonically clean with acetone, absolute ethanol and deionized water for 10 minutes;
[0028] Step 2: Ion implantation of Hf, Zr or Nb
[0029] (A) Put the pre-treated NiTi shape memory alloy substrate into the ion implanter, and set the vacuum pressure of the ion implanter to 1×10 -4 Pa, voltage 5~8KeV, sputtering time 10~30min, argon ion sputtering to remove surface impurities;
[0030] (B) Hf, Zr or Nb implantation in ion implanter:
[0031] Set the vacuum degree of the ion implanter to 1×10 -4 The injection amount of Pa, Hf, Zr or Nb element is 0.5×10 17 ~2.5×10 17 Ions / cm 2 , The voltage is 45KeV, the current is 1~4mA, and the ion implantation is completed after 15min~75min, and the shape memor...
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[0034] Example 1: Prepare NiTi shape memory alloy with Hf implanted on the surface, and the amount of Hf element implanted is 1.0×10 17 Ions / cm 2
[0035] Step 1: Pretreatment of the substrate
[0036] Select the NiTi shape memory alloy matrix with nearly equal atomic ratio, after grinding and polishing, ultrasonically clean with acetone, absolute ethanol and deionized water for 10 minutes;
[0037] Step 2: Ion implantation of Hf
[0038] (A) Put the pre-treated NiTi shape memory alloy matrix into the ion implanter and set the vacuum degree to 1×10 -4 Pa, voltage 5KeV, sputtering time 20min, argon ion sputtering to remove surface impurities;
[0039] (B) Hf element injection, set the vacuum pressure of the vacuum chamber to 1×10 -4 Pa, Hf element injection volume 1.0×10 17 Ions / cm 2 , Voltage 45KeV, current 2mA; the ion implantation is completed 30 minutes after the start, and the NiTi shape memory alloy with Hf implanted on the surface is prepared.
[0040] The prepared NiTi shape memo...
Example Embodiment
[0056] Example 2: Prepare NiTi shape memory alloy with Hf implanted on the surface, the amount of Hf element implanted is 2.5×10 17 Ions / cm 2
[0057] Step 1: Pretreatment of the substrate
[0058] Select the NiTi shape memory alloy matrix with nearly equal atomic ratio, after grinding and polishing, ultrasonically clean with acetone, absolute ethanol and deionized water for 10 minutes;
[0059] Step 2: Ion implantation of Hf
[0060] (A) Put the pre-treated NiTi shape memory alloy matrix into the ion implanter, and set the vacuum degree to 1×10 -4 Pa, voltage 5KeV, sputtering time 20min, argon ion sputtering to remove surface impurities;
[0061] (B) Hf element injection, set vacuum degree 1×10 -4 Pa, Hf element injection volume 2.5×10 17 Ions / cm 2 , Voltage 45KeV, current 2mA; 75min after starting ion implantation, the NiTi shape memory alloy with Hf implanted on the surface is prepared.
[0062] The surface morphology and composition of the NiTi shape memory alloy with Hf implanted o...
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