Dental implant with micron-nanometer multi-grade micro-surface structure and preparation method

A dental implant and nanotechnology, applied in dentistry, dental implants, dentures, etc., can solve the problems of insufficient bonding force between the surface structure and the substrate, and achieve the effect of increasing the activity of osteoblasts, accelerating the formation and stabilizing

Inactive Publication Date: 2010-12-22
JILIN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The present invention also provides a method for preparing the surface of a titanium dental implant with a micron-nanometer multi-level microstructure, which uses titanium as a substrate to etch out a micro-nano multi-level microstructure in a short period of time, which is uniform and consistent, and greatly Improve work efficiency and solve the problem of insufficient bonding force between the surface structure and the substrate

Method used

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  • Dental implant with micron-nanometer multi-grade micro-surface structure and preparation method
  • Dental implant with micron-nanometer multi-grade micro-surface structure and preparation method

Examples

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Embodiment 1

[0021] (1) After the titanium specimen leaves the factory, after removing the passivation film on the surface, place it in acetone, 95% ethanol, and deionized water for ultrasonic cleaning for 10 minutes, and then dry it;

[0022] (2) Preparation of electrolyte: concentration of hydrofluoric acid: 7.3mol / L; concentration of hydrochloric acid: 0.5mol / L;

[0023] (3) Electrode setting: the anode is a titanium dental implant, and the cathode is a platinum sheet;

[0024] (4) Processing parameters: solution temperature 12°C, etching time 6min, current density 500mA / cm 2 ;

[0025] (5) After the titanium dental implant treated in step (1) was placed in the electrolyte for treatment, it was then placed in acetone, 95% ethanol, and deionized water for ultrasonic cleaning and drying; to form a micron- -Nano-microstructured surface to obtain bowl-shaped micro-concaves on the titanium surface: about 20-50 μm in diameter, micropores: about 2-5 μm in diameter, nano-cavities, nanopores a...

Embodiment 2

[0027] (1) After the titanium specimen leaves the factory, after removing the passivation film on the surface, place it in acetone, 95% ethanol, and deionized water for ultrasonic cleaning for 10 minutes, and then dry it;

[0028] (2) Electrolyte solution prepared in the electrolytic cell: concentration of hydrofluoric acid: 0.2mol / L; concentration of hydrochloric acid: 11.5mol / L;

[0029] (3) Electrode setting: the anode is a titanium dental implant, and the cathode is a platinum sheet;

[0030] (4) Processing parameters: solution temperature 50°C, etching time 1.5min, current density 100mA / cm 2 ;

[0031] (5) After the titanium dental implant treated in step (1) was placed in the electrolyte for treatment, it was then placed in acetone, 95% ethanol, and deionized water for ultrasonic cleaning and drying; to make the surface of the specimen form a micron- - Nanostructured surfaces (see figure 2 ).

Embodiment 3

[0033] (1) After the titanium specimen leaves the factory, after removing the passivation film on the surface, place it in acetone, 95% ethanol, and deionized water for ultrasonic cleaning for 10 minutes, and then dry it;

[0034] (2) Electrolyte solution prepared in the electrolytic cell: concentration of hydrofluoric acid: 5.6mol / L; concentration of hydrochloric acid: 5.8mol / L;

[0035] (3) Electrode setting: the anode is a titanium dental implant, and the cathode is a platinum sheet;

[0036] (4) Processing parameters: solution temperature 22°C, etching time 5min, current density 950mA / cm 2 ;

[0037] (5) After the titanium dental implant treated in step (1) was placed in the electrolyte for treatment, it was then placed in acetone, 95% ethanol, and deionized water for ultrasonic cleaning and drying; to make the surface of the specimen form a micron- - Nanostructured surfaces (see figure 2 ).

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Abstract

The invention provides a dental implant with a micron-nanometer multi-grade micro-surface structure and a preparation method. The homogenous and uniform dental implant with the micron-nanometer multi-grade micro-structure is etched by using titanium as a substrate in a short time period, so that working efficiency is greatly improved and the problem of lacking bonding force between the surface structure and the substrate is solved.

Description

technical field [0001] The invention discloses a surface of a titanium dental implant with a micron-nano multi-level structure, and also provides a preparation method thereof, belonging to the medical technical field of artificial tooth root implants. Background technique [0002] Titanium metal has good and stable biocompatibility, can form osseointegration with bone tissue, and is widely used in the field of oral implantation as a dental implant material. However, titanium is a biologically inert material. In order to increase the contact area between dental implants and bone tissue, all oral implant systems are surface treated. Studies have shown that micron concaves can increase the mechanical chimerism of the bone and improve the mechanical properties of the implant; it can stabilize the deposition of fibrin blood clots on the surface of the implant and fix the fragile extracellular matrix scaffold. The nanosurface simulates the natural cell environment, increases pro...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61C8/00A61C13/08
Inventor 孟维艳周延民蔡青杨立明张艳靖
Owner JILIN UNIV
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