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Solar battery reducing reflection coating and preparation method thereof
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A solar cell and anti-reflection film technology, which is applied in the field of solar cells, can solve the problems of poor uniformity and compactness of the anti-reflection film, and achieve the effects of dense film, uniform thickness, and improved conversion efficiency
Active Publication Date: 2011-03-23
BYD CO LTD
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Problems solved by technology
[0005] The technical problem to be solved by the present invention is: the poor uniformity and compactness of the anti-reflection film in the prior art, thereby providing a solar cell anti-reflection film with good uniformity and compactness
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[0013] A method for preparing an anti-reflection film for a solar cell, which includes the first coating, cooling, and the second coating; wherein the coating includes pre-passivation, deposition of silicon nitride, and post-passivation.
[0014] Wherein, the silicon wafer refers to a silicon wafer that has undergone processes such as texturing, diffusion, and back knot removal.
[0015] The specific steps of passivation in the present invention are: putting the silicon chip into the PECVD reaction chamber, vacuuming, feeding passivation gas, and high-frequency discharge.
[0016] In the present invention, the PECVD reaction chamber is preferably evacuated to below 4Pa, and the temperature of the reaction chamber is raised to 300-500° C. and kept at a constant temperature; then passivation gas is introduced.
[0017] The passivation gas is well known to those skilled in the art, and the passivation gas in the present invention is preferably ammonia. The flow rate of passivati...
Embodiment 1
[0043] 1. Pre-passivation: After inserting the silicon wafer into the graphite boat, enter the PECVD reaction chamber through the push boat system, and evacuate to 4Pa; then raise the temperature of the PECVD reaction chamber to 400°C and keep it at a constant temperature; then pass 5000sccm into it NH 3 , and keep the pressure at 230Pa, turn on the 2500W high-frequency power supply for high-frequency discharge, after 180s of discharge, turn off the power supply and gas;
[0044] 2. Deposition: Introduce 230 sccmSiH into the PECVD reaction chamber 4 and 2100sccmNH 3 , and keep the vacuum of the reaction chamber at about 260Pa, turn on the 2500W high-frequency power supply, and after discharging for 102s, turn off the power supply and cut off the gas;
[0045] 3. Post-passivation: 3000sccm NH 3 To 230Pa, turn on the 2500W high-frequency power supply, discharge for 300s, turn off the power supply, cut off the gas; then evacuate the reaction chamber and purge the reaction cham...
Embodiment 2
[0050] The difference from Example 1 is: the first coating time is 6s, and the second coating time is 600s. Other parts are with embodiment 1.
[0051] A solar cell anti-reflection film A2 was prepared.
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Abstract
The invention belongs to the technical field of solar batteries, and in particular discloses a solar batter reducing reflection coating which comprises a siliconnitride film deposited on the front surface of a silicon slice, wherein the average refractive index of the siliconnitride is 2.1-2.3 and the average reflectivity of the silicon nitride is 1-10 percent. The invention also discloses a preparation method of the solar battery reducing reflection coating, which comprises the step of carrying out primary film coating, cooling and secondary film coating on the silicon slice, wherein each time of film coating comprises the steps of front passivation, silicon nitride deposition and rear passivation. The reducing reflection coating provided in the invention has the advantages of uniform thickness, compactness, good adhesiveness and low reflectivity, and can ensure that the thickness of the coating is controlled to be 50-90nm. The preparation method has the advantages of low deposition temperature and good deposition effect.
Description
technical field [0001] The invention relates to the technical field of solar cells, in particular to an antireflection film for solar cells and a preparation method thereof. Background technique [0002] The anti-reflection coating of solar cells can greatly reduce the reflection loss of silicon wafers to light on the one hand, thereby improving the photoelectric conversion efficiency of solar cells. On the other hand, it can also improve the lifetime of minority carriers, thereby improving battery efficiency. [0003] At present, the anti-reflection film for solar cells is mainly silicon nitride film, and the existing methods for preparing silicon nitride film are mainly PECVD (plasma enhanced chemical vapor deposition) and sputtering. Among them, PECVD is widely used. [0004] The silicon nitride thin film prepared by the existing PECVD method is generally passivated by passing passivation gas first, passivated by high-frequency discharge, and then passed by silane and a...
Claims
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