Laser micro/nano processing system and method
A micro-nano processing and laser technology, applied in laser welding equipment, metal processing equipment, nanotechnology, etc., can solve problems such as difficult material processing, and achieve the effect of expanding the scope of processing materials
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example 1
[0103] The specific implementation steps of preparing the line array structure in the photoresist with the trade name of SCR500 placed on the glass substrate will be described in detail below in conjunction with the laser micro-nano processing system according to the present invention.
[0104] The laser micro-nano processing system 100 includes: a laser 1 , a half-mirror 3 , a frequency doubling crystal 5 , an optical delay component 9 , an optical focusing component and a moving platform 21 . The laser 1 is, for example, a titanium sapphire femtosecond pulsed laser with an output wavelength of 800 nm, a pulse width of 100 fs, a pulse repetition frequency of 82 MHz, a beam diameter of 1.8 mm, and a linearly polarized laser beam. On the output optical path of the Ti:Sapphire femtosecond pulsed laser 1 is placed a half-mirror 3 made of BK7 glass, for example, with a transmittance-reflection ratio of 7:3 to form transmitted light and reflected light. The frequency multiplier on ...
example 2
[0109] The following is attached image 3 The system of the present invention and the specific implementation steps of preparing the dangling wire structure in the photoresist with the trade name SCR500 placed on the glass substrate by the system are described in detail:
[0110] The system includes: the laser 1 is a titanium sapphire femtosecond pulse laser, the output wavelength of the laser 1 is 800nm, the pulse width is 100fs, the pulse repetition frequency is 82MHz, the beam diameter is 1.8mm, and the polarization state is linear polarization; firstly, turn on the titanium sapphire Femtosecond pulsed laser 1, a half mirror 3 made of BK7 glass is placed on the output optical path, and the transmission and reflection ratio is 7:3; an I-type BBO frequency-doubling crystal with a thickness of 1 mm is placed sequentially along the main axis on the transmitted optical path 5 and a piece of interference filter 6 filtering 800nm wavelength to obtain pure beam diameter is 400nm wa...
example 3
[0112] The following combination image 3 The system of the present invention and the specific implementation steps for preparing a two-dimensional dot array structure in a photoresist with a trade name of SCR500 placed on a glass substrate using the system are described in detail:
[0113] The system includes: the laser 1 is a titanium sapphire femtosecond pulse laser, the output wavelength of the laser 1 is 800nm, the pulse width is 100fs, the pulse repetition frequency is 82MHz, the beam diameter is 1.8mm, and the polarization state is linear polarization; firstly, turn on the titanium sapphire Femtosecond pulsed laser 1, a half mirror 3 made of BK7 glass is placed on the output optical path, and the transmission and reflection ratio is 7:3; an I-type BBO frequency-doubling crystal with a thickness of 1 mm is placed sequentially along the main axis on the transmitted optical path 5 and a piece of interference filter 6 filtering 800nm wavelength to obtain pure beam diamete...
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