Monocrystal silicon wafer flocking process liquid and preparation method thereof

A single crystal silicon wafer and process liquid technology, applied in chemical instruments and methods, crystal growth, post-processing details, etc., can solve problems such as instability of suede process batches, affecting the appearance of cells and power generation efficiency, and achieve a solution Increased fragmentation rate, saving manpower, material resources and environmental protection

Inactive Publication Date: 2013-09-11
YANGZHOU HANYUAN NEW MATERIAL TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the biggest defect of the traditional alkali suede process is that due to the large amount of ethylene-propanol used, its low boiling point and volatile chemical properties cause instability between batches of the suede process, and a large number of mottled pieces often appear. And seriously affect the appearance and power generation efficiency of the cell

Method used

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Examples

Experimental program
Comparison scheme
Effect test

specific Embodiment 1

[0021] A monocrystalline silicon chip flocking process liquid, comprising the following raw materials in proportion by weight: 62 parts of industrial pure water; 5 parts of electronic grade potassium hydroxide; 5 parts of butyric acid; 4 parts of electronic grade sodium silicate.

[0022] The preparation method is:

[0023] (1) Add 10 parts of industrial pure water and 5 parts of electronic grade potassium hydroxide into the reaction kettle, stir at 800-2500r / min to promote its dissolution, and keep the temperature of the solution at 50°C to 80°C by heating the spacer , the stirring time is controlled within 15 to 30 minutes;

[0024] (2) After the potassium hydroxide is completely dissolved, add butyric acid gradually in the proportion of 5 parts, stir at 800-3000r / min to promote its dissolution, and keep the temperature of the solution at 50°C to 80°C by heating the spacer, and stir The time is controlled within 30-60 minutes;

[0025] (3) Add electronic grade sodium silic...

specific Embodiment 2

[0028] A monocrystalline silicon chip flocking process liquid, comprising the following raw materials in proportion by weight: 86 parts of industrial pure water; 15 parts of electronic grade potassium hydroxide; 15 parts of acetic acid; 8 parts of electronic grade sodium silicate.

[0029] The preparation method is:

[0030] (1) Add 30 parts of industrial pure water and 15 parts of electronic grade potassium hydroxide into the reaction kettle, stir at 800-2500r / min to promote its dissolution, and keep the temperature of the solution at 50°C to 80°C by heating the spacer , the stirring time is controlled within 15 to 30 minutes;

[0031] (2) After the potassium hydroxide is completely dissolved, add acetic acid in a proportion of 15 parts, stir at 800-3000r / min to promote its dissolution, and keep the temperature of the solution at 50°C to 80°C by heating the spacer. Control in 30-60 minutes;

[0032] (3) Add electronic grade sodium silicate in the proportion of 8 parts, stir...

specific Embodiment 3

[0035] A monocrystalline silicon chip flocking process solution, comprising the following raw materials in proportion by weight: 74 parts of industrial pure water; 10 parts of electronic grade potassium hydroxide; 10 parts of valeric acid; 6 parts of electronic grade sodium silicate.

[0036] The preparation method is:

[0037] (1) Add 20 parts of industrial pure water and 10 parts of electronic grade potassium hydroxide into the reaction kettle, stir at 800-2500r / min to promote its dissolution, and keep the temperature of the solution at 50°C to 80°C by heating the spacer , the stirring time is controlled within 15-30 minutes;

[0038] (2) After the potassium hydroxide is completely dissolved, add valeric acid gradually in the proportion of 10 parts, stir at 800-3000r / min to promote its dissolution, and keep the temperature of the solution at 50°C to 80°C by heating the spacer, and stir The time is controlled within 30-60 minutes;

[0039] (3) Add electronic grade sodium si...

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Abstract

The invention discloses monocrystal silicon wafer flocking process liquid and a preparation method thereof. The monocrystal silicon wafer flocking process liquid contains the following raw materials in parts by weight: 62-86 parts of industrial pure water, 5-15 parts of electronic-grade potassium hydroxide, 5-15 parts of CP-grade high-radix loop materials and 4-8 parts of electronic-grade sodium silicate. The preparation method of the monocrystal silicon wafer flocking process comprises the following steps: adding 10-30 parts of industrial pure water and 5-15 parts of electronic-grade potassium hydroxide or sodium hydroxide or the mixture of the two into a reactor, stirring and dissolving; adding 5-15 parts of CP-grade high-radix loop materials, stirring and dissolving; adding 4-8 parts of electronic-grade sodium silicate or potassium silicate or the mixture of the two, stirring and dissolving; adding 32-76 parts of hot pure water of 50-80 DEG C, stirring; and naturally cooling and packaging. The monocrystal silicon wafer flocking process liquid adopted the technical scheme has the advantages of removing monocrystal silicon wafer piebald, improving conversion efficiency of battery plates, lowering production cost of flocking surface and improving quality stability of the flocking surface.

Description

technical field [0001] The invention relates to a monocrystalline silicon chip flocking process liquid and a preparation method thereof. Background technique [0002] Silicon-based solar cells in today's world can be divided into two camps according to materials: polycrystalline and monocrystalline solar cells. The suede process is the first process in the solar cell process, and it is also a very critical process. Generally speaking, the reflectance of silicon-based materials for solar cells is 30-35%, which means that 100% of solar light is projected onto the silicon-based surface, and about 30-35% of solar light is reflected, and this part cannot be effectively used The energy of sunlight. The main function of the suede process is to minimize the reflectivity of silicon-based materials in order to maximize the use of the energy provided by sunlight. At present, the suede process can be divided into acid process and alkali process according to silicon-based materials. ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C30B33/10C23F1/40
Inventor 曹向阳江彤
Owner YANGZHOU HANYUAN NEW MATERIAL TECH
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