Low temperature plasma wastewater treatment device by radial-flow dielectric barrier discharge

A technology of low-temperature plasma and dielectric barrier discharge, which is applied in the direction of light water/sewage treatment, etc., can solve the problem of unsatisfactory wastewater treatment effect, and achieve the effect of prolonging life

Active Publication Date: 2011-10-26
SHANDONG UNIV
View PDF3 Cites 19 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Since the water intake method of the wastewater treatment device is similar to that of the exhaust gas treatment device, the wastewater treatment effect is still not ideal

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Low temperature plasma wastewater treatment device by radial-flow dielectric barrier discharge
  • Low temperature plasma wastewater treatment device by radial-flow dielectric barrier discharge
  • Low temperature plasma wastewater treatment device by radial-flow dielectric barrier discharge

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] A radial-flow dielectric barrier discharge low-temperature plasma wastewater treatment device, such as figure 1 As shown, it includes a low-temperature plasma experimental power supply 14, a high-voltage electrode 1 and a ground electrode 2. The lower surface of the high-voltage electrode is provided with a quartz glass layer 3, and the high-voltage electrode 1 is a circular structure with a radius of 50mm; the wastewater treatment device also includes a reactor 4 And waste water tank 5, reactor 4 comprises reaction cylinder 6, overflow reclaimer 7, waste water inlet 8 and waste water outlet 9, and reaction cylinder 6 is the hollow cylindrical structure that one end is open and the other end is closed, and the height of this cylindrical structure is 100mm, the radius is 50mm, the vertical distance between the opening edge of the reaction cylinder 6 and the lower surface of the quartz glass layer 3 is 8mm; Directly above the open end of 6, the ground electrode 2 is set i...

Embodiment 2

[0036] Radial flow dielectric barrier discharge low-temperature plasma wastewater treatment device as described in Example 1, the difference is that the high-voltage pole 1 is a circular structure with a radius of 40mm, the height of the reaction cylinder 6 is 120mm, and the radius is 40mm. The vertical distance between the edge of the opening of 6 and the lower surface of the quartz glass layer 3 is 10mm.

[0037]Dielectric barrier discharge low-temperature plasma was used to degrade methylene blue dye wastewater with an initial concentration of 200mg / L. The concentration of dye wastewater in the degradation process was measured at the maximum absorption wavelength of 662nm with an ultraviolet spectrophotometer. The degradation effect of the body on methylene blue is as follows Figure 4 As shown, when the discharge power is 200W, after 180min of degradation, the removal rate of methylene blue reaches more than 84%.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
radiusaaaaaaaaaa
radiusaaaaaaaaaa
Login to view more

Abstract

Belonging to the technical field of wastewater treatment, the invention relates to a low temperature plasma wastewater treatment device by radial-flow dielectric barrier discharge. The low temperature plasma wastewater treatment device by radial-flow dielectric barrier discharge comprises a power supply, a high-pressure electrode and a grounding electrode, and a dielectric layer disposed on the lower surface of the high-pressure electrode. The device is characterized by additionally including a reactor composed of a reaction cylinder that is a hollow column structure with an open end and a closed end, an overflow recoverer positioned on the outer wall of the reaction cylinder for recovering the wastewater flowing out of the open end of the reaction cylinder, a wastewater inlet and a wastewater outlet. Moreover, the high-pressure electrode is located over the open end of the reaction cylinder, the grounding electrode is arranged within the reaction cylinder, the wastewater inlet is mounted at the center of a horizontal cross-section in the reaction cylinder, and the wastewater outlet is installed at the bottom of the overflow recoverer. Able to generate low temperature plasmas of large volume and high energy concentration in a wide air pressure range, the wastewater treatment device of the invention can effectively degrade pesticide wastewater containing such as nitenpyram.

Description

technical field [0001] The invention relates to a radial-flow dielectric barrier discharge low-temperature plasma wastewater treatment device, which belongs to the technical field of sewage treatment. Background technique [0002] At present, the conventional pesticide wastewater treatment methods mainly include adsorption method, hydrolysis method, coagulation method, biochemical method and so on. However, the traditional treatment methods are difficult to meet the national environmental protection requirements due to low treatment efficiency, high cost and long treatment cycle. [0003] Nitenpyram is a new variety that is newly promoted in China to replace highly toxic organophosphorus pesticides. Its English common name is nitenpyram, and its chemical name is (E)-1-N-(6-chloro-3-pyridylmethyl). -N-ethyl-N'-methyl-2-nitro-1,1-vinylidenediamine, trade name: nitenpyram, its chemical structure is as follows: [0004] [0005] Due to the stable chemical properties of nite...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C02F1/30
Inventor 李善评姜艳艳崔江杰
Owner SHANDONG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap