Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Technological process of physical vapor deposition coating

A technology of physical vapor deposition and process method, which is applied in the field of physical vapor deposition coating, can solve the problems of high energy consumption and long processing time of PVD coating process, and achieve the effect of high cost performance, reducing processing time and improving bonding strength

Inactive Publication Date: 2011-11-02
SHANGHAI BA ER & NEW MATERIAL SCI & TECH
View PDF0 Cites 23 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] Aiming at the shortcomings of the existing PVD coating process, such as high energy consumption and long processing time, the purpose of the present invention is to provide a physical vapor deposition coating process

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] Embodiment 1: The physical vapor deposition equipment consists of a reaction chamber, an electromagnet magnetic control device connected to the reaction chamber, and a gas supply device connected to the chamber of the reaction chamber. The chamber of the reaction chamber is provided with a deflection source for placing the matrix material. Physical vapor deposition equipment adopts common deposition equipment on the market.

[0021] A kind of processing method of physical vapor deposition coating of the present invention, its steps are as follows:

[0022] a. Carry out nitriding treatment on the surface of the pre-processed substrate: place the substrate material on the deflection source in the reaction chamber of the physical vapor deposition equipment, keep the vacuum in the reaction chamber, and pass argon and nitrogen into the reaction chamber, and the reaction time is 50 to 100 minutes ;

[0023] b. Form a deposited film on the surface of the substrate: turn off ...

Embodiment 2

[0030] Example 2: When preparing a CRN coating, the flow rate of argon gas in step a is 22 ml / min, the flow rate of nitrogen gas is 49 ml / min, and the thickness of the coating is 2-4 μm. Other parameters and steps of this example are the same as those of Example 1 .

[0031] PVD is suitable for depositing coatings on most cutting tool molds and components. Applications include cutting tools and forming tools, wear-resistant parts, medical devices and decorative products. Most of the original PVD coating technology can only coat the hard surface layer, but the present invention can carry out nitriding treatment on the surface layer of the pre-processed product and harden the soft surface layer, so that PVD processing can be performed on the soft surface layer object. This process can significantly improve the surface properties of some metal materials, and can be applied to various occasions that have certain requirements on surface hardness, friction coefficient, working envir...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a technological process of a physical vapor deposition coating, relating to the technical field of metal machining and aiming at solving problems of large energy consumption and long treatment time in a traditional physical vapor deposition coating process. The technological process disclosed by the invention has the following steps of: (a) nitriding treatment: placing a matrix material on a deflection source in a reaction chamber and introducing nitrogen and inert gas into the vacuum reaction chamber, wherein the reaction time is 50-100 minutes; and (b) film deposition: closing the nitrogen , cooling the reaction chamber, introducing coating material plasma gas into the reaction chamber, and bombarding the matrix material nitrided in the step (a) by using the coating material plasma gas, wherein the reaction time is 50-100 minutes. The technological process of the physical vapor deposition coating, disclosed by the invention, is applicable to the coating treatment of the surfaces of most of tool molds and parts.

Description

technical field [0001] The invention relates to the technical field of metal processing, in particular to a process method of physical vapor deposition coating. Background technique [0002] Today's manufacturing industry has undergone revolutionary changes, and the modern manufacturing technology based on CNC machine tools is moving towards the direction of high-speed, dry cutting. Since tool coating technology can greatly improve the overall performance of cutting tools, especially the concept of superhard film design in recent years, it can effectively improve the high-temperature performance of tools in theory, so that coated tools can be used in high-speed, dry Machining becomes possible. [0003] Physical Vapor Deposition (PVD, Physical Vapor Deposition) is an advanced surface treatment technology widely used in the world at present, and can provide various single or multi-layer coating processing services for objects, tools, workpieces, etc. Its working principle is...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C23C14/22C23C14/06
Inventor 吴舢红
Owner SHANGHAI BA ER & NEW MATERIAL SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com