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Photobase generator

A compound and general formula technology, applied in the field of photobase generators, can solve the problems such as the reduction of the base generation efficiency of the photobase generators

Active Publication Date: 2011-11-02
FUJIFILM WAKO PURE CHEM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, since the episulfide compound which is the precursor of the episulfide resin exhibits absorption at a wavelength around 300 nm, a photobase generator having a photosensitive region for light (active energy rays) similarly centered around a wavelength around 300 nm is used. In the case of a photobase generator, there is a problem that the alkali production efficiency of the photobase generator is reduced

Method used

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Examples

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Embodiment

[0173] The present invention will be specifically described below based on examples, but the present invention is not limited to these examples.

Synthetic example 1

[0174] Synthesis Example 1: Synthesis of 9-Anthracenylmethyl 4'-Nitrophenyl Carbonate (First Step)

[0175] To a solution obtained by dissolving 5.0 g (24 mmol; manufactured by Wako Pure Chemical Industries, Ltd.) of 9-anthracenemethanol in 250 mL of dehydrated dimethylacetamide (dehydrated DMAc), 7.3 g (72 mmol) of triethylamine was added. To this solution, 4.9 g (24 mmol; manufactured by Wako Pure Chemical Industries, Ltd.) of chloroformic acid-4-nitrophenyl was added, followed by stirring at room temperature for 24 hours to perform a reaction. After the reaction was terminated, ice water was poured into the reaction liquid, the mixed liquid was extracted with dichloromethane, and the extracted organic layer was further washed with water, and then the organic layer was concentrated. Next, water was poured into the concentrated residue, and the crystals generated therein were collected by filtration, and the obtained crystals were dried to obtain 4.8 g of 9-anthracenylmethyl ...

Embodiment 1

[0177] Embodiment 1: Synthesis of 9-anthracenylmethyl 1-piperidine carboxylate (second process)

[0178] After adding 1.4 g (16 mmol) of piperidine to a solution obtained by dissolving 4.8 g (13 mmol) of 9-anthracenylmethyl 4′-nitrophenyl carbonate obtained in Synthesis Example 1 in 100 mL of dichloromethane, the The reaction was carried out by stirring at room temperature for 1 hour. After the reaction was terminated, the reaction solution was washed with water, and the washed organic layer was concentrated. The obtained concentrated residue was purified by column chromatography (filler: silica gel (Wakogel C-200; manufactured by Wako Pure Chemical Industries, Ltd.), developing solvent: dichloromethane) to obtain the above formula [10] in light yellow crystals. 1.3 g of the indicated 9-anthrylmethyl 1-piperidine carboxylate (yield: 32%). Shown below 1 Measurement results of H-NMR and melting point.

[0179] 1 H-NMR (400MHz, CDCl 3 ) δ (ppm): 1.39 (2H, br, CH 2 ), 1.53 ...

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Abstract

Provided are novel compounds which generate bases easily when irradiated with long-wavelength light (active energy rays), a photobase generator containing the compounds, and a photobase generation method. Disclosed are compounds represented by general formula [1], a photobase generator containing the compounds, and a photobase generation method. (In the formula [1], Ar represents a group with a specific structure selected from a group comprising an anthracenyl group, an anthraquinonyl group and a pyrenyl group; R<1> and R<2> independently represent a hydrogen atom or a straight-chain, branched, or cyclic alkyl group with carbon number 1 to 10, or they represent a group which forms a nitrogen-containing aliphatic ring or a nitrogen-containing aromatic ring with carbon number 3 to 8 which may have a substituent along with a nitrogen atom to which said group is bonded; and R<3> and R<4> independently represent a hydrogen atom or a straight-chain, branched, or cyclic alkyl group with carbon number 1 to 10).

Description

technical field [0001] The present invention relates to a compound having the property of generating a base by irradiation of light (active energy ray) and a photobase generator containing the same. More specifically, the present invention relates to a high Sensitive compounds and photobase generators containing these compounds. Background technique [0002] For curing based on light (active energy ray) sensitive polymerization initiator (hereinafter sometimes only referred to as photopolymerization initiator.) It is sometimes simply referred to as a thermal polymerization initiator.) Compared with curing (hereinafter sometimes simply referred to as thermal curing.), it has many advantages such as being able to cure at a low temperature and in a short time, and to be able to form fine patterns, so it is widely used in coatings. , printing inks, dental materials, resists and other surface processing fields. [0003] The photopolymerization initiators used in photocuring tec...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C07C271/12C07D211/44C07D233/60C07D295/20C09K3/00
CPCC07D295/20C07C271/24C07D295/205C07C2103/24C07C2101/14C07D233/60C07D211/46C07C271/12C07D211/44C07C2601/14C07C2603/24C07C271/14C09K3/00
Inventor 藏本绚子角野元重酒井信彦
Owner FUJIFILM WAKO PURE CHEM CORP
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