Sequential controllable nanometer silicon quantum dot array resistive random access memory and preparation method thereof
A technology of resistive memory and silicon quantum dots, which is applied in nanostructure manufacturing, nanotechnology, nanotechnology, etc., can solve the problem that silicon nanodot films cannot be used as resistive memory based on an ordered and controllable nano-silicon quantum dot array structure, etc. problems, to achieve high current densities
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[0050] The difference between this embodiment and the above-mentioned embodiment lies in the decomposition of silane (SiH) on the P+ silicon substrate material. 4 ) And laughing gas (NO 2 ), so the amorphous hydrogen-containing silicon-rich silicon oxide (a-Si x O:H) Thin film sublayer instead of silicon nitride thin film sublayer. The ordered thyristor quantum dot array resistive memory thus obtained includes a P+ silicon substrate material, a resistive silicon quantum dot multilayer film nanopillar array attached to the substrate material, and a resistive silicon The upper and lower electrodes on the upper surface of the quantum dot multilayer film nanopillar array and the lower surface of the substrate; the resistive multilayer film nanopillar array has an insulating dielectric layer; the silicon quantum dot multilayer film nanopillar consists of at least 7-10 cycles It is composed of sublayers of silicon-rich silicon oxide films with different oxygen components embedded wit...
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