Catalyst chemical vapor deposition apparatus
A chemical vapor growth, catalyst technology, applied in physical/chemical process catalysts, gaseous chemical plating, liquid chemical plating and other directions, can solve the problems of low mechanical strength, unassisted production efficiency, temperature rise, etc.
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no. 2 approach
[0040] Next, the catalyst-assisted chemical vapor growth method in the second embodiment of the present invention will be described.
[0041] Inside the reaction chamber 2 are provided a substrate S and a tantalum wire as a wire catalyst 6 . Then, the vacuum pump 4 is operated to exhaust the gas inside the vacuum chamber 3 and make it into a vacuum state. At this time, the inside of the reaction chamber 2 can be decompressed to a predetermined vacuum degree (for example, 1 Pa). Next, the raw material gas and diborane gas are introduced into the reaction chamber 2 from the raw material gas supply part 9a and the diborane gas supply part 9b through the gas introduction pipe 7, and the filament catalysts 6 are energized by the control part 8 to turn them Heating to a temperature above the specified value (for example, 1700°C).
[0042] The diborane gas introduced into the reaction chamber 2 contacts and decomposes the filament catalyst 6 , thereby forming a boride (tantalum bori...
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