System and process for recovering pure hydrogen and liquid HCl through polysilicon tail gas treatment

A tail gas treatment and polysilicon technology, applied in hydrogen separation, chemical industry, halogenated silane, etc., can solve problems such as inability to balance condensation temperature and reboiling temperature, large temperature difference in rectification tower, change of operating pressure, etc., to eliminate equipment safety Hidden dangers in operation, saving resources, and reducing the effect of axial temperature difference
CN102249187AInactive Publication Date: 2011-11-23SICHUAN TECHAIRS
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Patent Information

Authority / Receiving Office
CN Β· China
Patent Type
Applications(China)
Current Assignee / Owner
SICHUAN TECHAIRS
Publication Date
2011-11-23
Estimated Expiration
Not applicable Β· inactive patent

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Abstract

The invention discloses a system for recovering pure hydrogen and liquid HCl through polysilicon tail gas treatment, and the system mainly comprises a tail gas circulated condensing and washing tower, a chlorosilane stripper and a HCl rectifying tower, wherein the tail gas circulated condensing and washing tower is equipped with a polysilicon tail gas inflow pipe, a first chlorosilane solution outflow pipe and a first hydrogen outflow pipe, and the first chlorosilane solution outflow pipe is connected with the chlorosilane stripper; the chlorosilane stripper is equipped with a reboiler, a second chlorosilane solution outflow pipe, a first HCl outflow pipe and a stripping backflow pipe, and the first HCl outflow pipe and the stripping backflow pipe are connected with the HCl rectifying tower; and the HCl rectifying tower is equipped with a condenser, a separator and a second HCl outflow pipe which are connected in turn, and the separator is equipped with a non-condensable gas outflow pipe. The invention also discloses a process for recovering pure hydrogen and liquid HCl through polysilicon tail gas treatment. Through the system and process disclosed by the invention, the polysilicon tail gas is turned into things of value, the resources are saved, and simultaneously the energy consumption during the treatment process is reduced.
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Description

technical field

[0001] The invention relates to polysilicon tail gas recovery and treatment technology, which belongs to the field of gas separation, and specifically refers to a polysilicon tail gas treatment system and a process for recovering pure hydrogen and liquid HCL. Background technique

[0002] In the production of polysilicon, a large amount of tail gas will be produced in the synthesis process and reduction process of trichlorosilane. It is estimated that for every 1 kg of polysilicon product produced, 40 kg of tail gas will be produced. The main components are: hydrogen (H2), hydrogen chloride (HCL), Dichlorodihydrosilane (SiH2CL2), trichlorosilane (SiHCL3), and silicon tetrachloride (SiCL4), where SiH2CL2, SiHCL3, and SiCL4 are collectively referred to as chlorosilanes.

[0003] Polycrystalline silicon tail gas is not only an effective raw material gas or an intermediate product, but also a substance that is extremely harmful to the environment. If it is only d...

Claims

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