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Device and method for laser etching cathode film material of OLED display

A thin film material, laser etching technology, applied in laser welding equipment, welding equipment, metal processing equipment and other directions, can solve the problems of difficult spacing control, complicated and cumbersome processes, weak selectivity, etc., to achieve good etching linearity, The effect of high luminous efficiency and thin line width

Inactive Publication Date: 2011-12-21
SUZHOU DELPHI LASER
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  • Abstract
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  • Claims
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Problems solved by technology

[0005] The purpose of the present invention is to overcome the deficiencies in the prior art, to provide a device and method for laser etching cathode thin film materials of OLED displays, to realize the etching of cathodes of OLED displays, to obtain thinner and more stable line widths, and not Damage the substrate, so as to overcome the shortcomings of traditional chemical wet etching methods such as complex and cumbersome procedures, difficult spacing control, poor selectivity, and environmental pollution.

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  • Device and method for laser etching cathode film material of OLED display
  • Device and method for laser etching cathode film material of OLED display

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Embodiment Construction

[0014] The present invention proposes a micromachining method and system using laser etching for OLED display cathodes. Laser etching can avoid the inherent disadvantages of chemical wet methods, and the laser has the characteristics of non-contact, non-polluting environment, and easy control, making it an OLED display It is an important application hotspot of cathode pattern line width control, and will gradually be widely used in industry. Using a laser to etch the cathode of an OLED display can achieve a relatively stable line width, making the line width of the cathode as thin as 20um. During production, the etched pattern can be easily replaced without waste generation, which can save a lot of research and development costs and shorten the product development cycle. The high-precision control system and mechanism design can perform high-efficiency etching, fast, stable, and high repeatability, which can ensure the stability and precision of processing and greatly improve t...

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Abstract

The invention relates to a device and method for laser etching cathode thin film materials of OLED displays. An electric shutter and an electric beam expander are arranged at the output end of the high-frequency short-pulse laser, and a 1 / 2 wave plate is arranged at the output end of the electric beam expander. 1 The output end of the / 2 wave plate is arranged with a polarization beam splitter, the output end of the polarization beam splitter is arranged with a first half-mirror and a first 45-degree reflector, and the output end of the first half-mirror is arranged with a first focusing mirror and a first half-mirror. The second 45-degree reflective mirror, the output end of the second 45-degree reflective mirror is arranged with a second focusing mirror, the output end of the first 45-degree reflective mirror is arranged with a second half mirror, and the output end of the second half mirror is arranged There is a third focusing mirror and a third 45-degree reflecting mirror, and a fourth focusing mirror is arranged at the output end of the third 45-degree reflecting mirror, and the output end of the focusing mirror is facing the two-axis adsorption platform. The cathode material of the OLED display is vaporized under the action of a high-frequency short-pulse laser to achieve the purpose of erosion, and the four beams realize the line etching of the cathode area.

Description

technical field [0001] The invention relates to a micromachining method and equipment for using laser to etch cathode thin film materials of OLED displays. Background technique [0002] In recent years, organic light emitting diode (OLED) has become a very popular emerging flat panel display industry, mainly because OLED displays have self-illumination, wide viewing angle (over 170 degrees), and fast response time (on the order of 1 μs). , high luminous efficiency, low working voltage (3-10V), thin panel thickness (less than 2mm), large-size and bendable (flexible) panels can be produced, the process is simple, and it has low-cost potential (expected to be lower than TFT- LCDs are about 20% cheaper). [0003] The OLED device structure can be roughly divided into four main areas: substrate, anode, organic light-emitting material and cathode. In order to effectively inject electrons or holes into organic materials, as mentioned above, lowering the injection energy barrier i...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B23K26/00B23K26/067B23K26/14B23K26/142B23K26/362
Inventor 赵裕兴狄建科张伟
Owner SUZHOU DELPHI LASER
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