A kind of preparation method of surface-enhanced Raman spectroscopy active substrate

A technology of surface-enhanced Raman and active substrates, which is applied in the process of producing decorative surface effects, the manufacture of microstructure devices, decorative arts, etc. The effect of uniformity

Inactive Publication Date: 2011-12-21
XIAMEN UNIV
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Problems solved by technology

[0017] The purpose of the present invention is to provide a method for preparing a surface-enhanced Raman spectroscopy active substrate with both high uniform

Method used

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  • A kind of preparation method of surface-enhanced Raman spectroscopy active substrate
  • A kind of preparation method of surface-enhanced Raman spectroscopy active substrate
  • A kind of preparation method of surface-enhanced Raman spectroscopy active substrate

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Embodiment Construction

[0033] The technical solutions of the present invention will be further described below in conjunction with the embodiments.

[0034] 1) According to the steps of acetone, ethanol, and three times of water, ultrasonically clean a 1cm×1cm silicon wafer, wash each solution for 15 minutes, and then use a mixed solution of ammonia water:hydrogen peroxide:three water ratios of 1:1:6 to heat and soak at 70°C. Silicon wafer 30min. Take out the silicon wafer and ultrasonicate it with water three times for 15 minutes, then dry it with nitrogen gas, and treat it with ozone plasma for 10 minutes for later use.

[0035] 2) Almost fill the 50mL beaker with water, then add 6 μl of 2% sodium lauryl sulfate solution dropwise, and let stand.

[0036] 3) Dilute 0.46 μm polystyrene microbeads purchased from sigma with ethanol at a ratio of 1:1, then drop 5 μl of the diluted solution onto the silicon wafer in step 1), and slowly immerse the silicon wafer into the silicon wafer prepared in step 2...

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Abstract

The invention relates to a surface-enhanced Raman spectrum and a micromachining technique, in particular to a preparation method for a surface-enhanced Raman spectrum active substrate which has very high uniformity and is better enhanced. The preparation method comprises the steps of spreading single-layer polystyrene nano micro-bead arrays on a water surface; preparing spaced single-layer polystyrene nano micro-bead arrays by using a reaction plasma etching technique; and preparing the surface-enhanced Raman spectrum active substrate. The obtained surface-enhanced Raman spectrum active substrate has high uniformity and high strength at the same time. Periodic metal nano structures are arranged on a smooth silicon or glass surface. The preparation method is mainly characterized in that metal nano spacing can be adjusted and controlled and a high-activity and high-uniformity substrate can be obtained. By adopting the preparation method, the defects of the surface-enhanced Raman substrate prepared by adopting a conventional template method can be overcome and the high-quality surface-enhanced Raman substrate can be obtained by using the existing commercial materials at the same time.

Description

technical field [0001] The invention relates to a surface-enhanced Raman spectrum and microprocessing technology, in particular to a method for preparing a surface-enhanced Raman spectrum substrate with high uniformity and high activity. Background technique [0002] Surface-enhanced Raman spectroscopy (SERS) is a spectroscopic technique with high sensitivity and molecular recognition ability, and its sensitivity is 10 times higher than that of ordinary Raman. 6 order of magnitude. In addition to its high sensitivity, SERS has the following characteristics compared with other spectroscopic techniques: 1. It must be enhanced on a roughened metal surface, and it must be nano-scale roughened to have better enhancement; 2. Metal Most of the substrates are gold, silver, and copper, and these three metals have the best enhancement effect; 3. Molecules must be adsorbed on the surface of the substrate, because as the distance from the surface increases, the signal decays exponentia...

Claims

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Application Information

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IPC IPC(8): B81C1/00C23C14/24C23C14/20
Inventor 周勇亮张大霄胡冬洁房晶炎张维
Owner XIAMEN UNIV
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