Manufacturing process of monocrystalline silicon ingot and thermal field structure of ingot furnace
A manufacturing process, monocrystalline silicon technology, applied in the field of crystal growth in the photovoltaic industry, can solve the problem that the conversion rate of polysilicon is only 15%~16%, achieve the effect of improving photoelectric conversion efficiency, increasing production, and improving economic benefits of enterprises
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[0027] The bottom lifting device (9) is fixed on the bottom of the furnace body (1), and its main function is to drive the thermal insulation ring (4) to move up and down to protect the seed crystal from being melted.
[0028] The thermal insulation ring strip (4) is composed of four thermal insulation strips fixed on the upper surface of the bottom frame (10), located between the graphite crucible (6) and the thermal insulation board (5), and the initial position is at the same level as the lower end of the graphite crucible (6). Qi is called "zero position" in the industry. The lower end surface of the bottom frame (10) is provided with a lifting rod (8), which is driven up and down by the bottom lifting device (9).
[0029] The silicon material (13) is placed in the quartz crucible (7), the outer layer of the quartz crucible (7) is protected by the graphite crucible (6), and the quartz crucible (7) and the graphite crucible (6) are placed on the heat exchange table (11), T...
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