Method and device for preparing film coating micronano texture

A preparation device, micro-nano technology, applied in the direction of micro-structure devices, manufacturing micro-structure devices, coatings, etc., can solve the problems of increasing the difficulty of micro-nano texture design and manufacturing, achieve high-efficiency thin-film coating deposition, improve light reduction Friction and anti-wear performance, the effect of simple process

Inactive Publication Date: 2012-04-18
CHINA UNIV OF MINING & TECH
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AI Technical Summary

Problems solved by technology

When the characteristic size of the texture is on the order of microns, submicrons or even nanometers, the preparation of thin film coatings on it will greatly affect the shape and size of the texture, and even cover all the micro-nano textures, increasing Difficulty in designing and manufacturing micro-nano textures

Method used

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  • Method and device for preparing film coating micronano texture
  • Method and device for preparing film coating micronano texture
  • Method and device for preparing film coating micronano texture

Examples

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Embodiment 1

[0024] Embodiment 1: The preparation method includes preliminary preparation, film coating deposition, micro-nano texture preparation and post-treatment, and its steps are as follows:

[0025] Preliminary preparations: first prepare the smooth samples required for the preparation of thin film coating micro-nano textures, establish the multi-beam pulse laser micro-nano texture processing system device, and prepare the three steps required to establish the multi-beam pulse laser micro-nano texture processing system device. Large module components, three major module components are pulse laser module 1-1, optical transmission module 1-2, precision scanning module 1-3, according to pulse laser module 1-1, optical transmission module 1-2, precision scanning module 1- 3 sequentially connected;

[0026] Thin film coating deposition: control the scanning speed of the multi-beam pulsed laser on the sample surface from 0.01 to 10mm / s, adjust the chemical reaction speed of the reactive g...

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Abstract

The invention relates to a method and a device for preparing a film coating micronano texture and belongs to a film coating of surface engineering. The preparation method comprises the steps of preparing at early stage, depositing the film coating, preparing the micronano texture and performing aftertreatment. The special device is a multi-beam pulse laser micronano texture processing system device. The multi-beam pulse laser micronano texture processing system device comprises a pulse laser module, an optical path transmission module and a precise scanning module which are connected with one another sequentially. The invention has the advantages that: the method and the device are convenient in processing and high in efficiency; preparation for the film coating deposition micronano texture on the surface of a material is realized by one laser source; the process is simple, and easy to control; the prepared samples are not subjected to a complex posttreatment process; the application range is wide; ultraviolet pulse laser has the characteristics of large photon energy and short wavelength and can perform precise micronano texture treatment on any materials; chemical reaction of various gases can be induced; and film coating deposition can be performed efficiently.

Description

technical field [0001] The invention relates to a thin-film coating for surface engineering, in particular to a preparation method and a device for the micro-nano texture of the thin-film coating. Background technique [0002] Thin film coating is a key symbol of surface engineering independent of heat treatment, electroplating, thermal spraying, etc., and has become an independent technical field. On the basis of traditional tribological materials, surface anti-friction and anti-wear film coatings provide an effective and vital solution and way to optimize the tribological properties of mechanical systems and solve material wear. [0003] The preparation methods of thin film coatings mainly include physical vapor deposition, chemical vapor deposition, plasma chemical vapor deposition, ion beam assisted deposition and ion implantation, etc.; the composition develops from a single component to three or four components, and at the same time New coating materials are also soug...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/44C23C16/52B81C1/00B82Y40/00
Inventor 杨海峰贺海东郝敬斌朱华
Owner CHINA UNIV OF MINING & TECH
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