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Super-clean high-purity phosphoric acid production process

A production process, phosphoric acid technology, applied in the direction of phosphorus compounds, inorganic chemistry, non-metallic elements, etc., can solve the problems of ineffective impurity removal, unfavorable economic benefits, low production efficiency, etc., and solve the problems of poor economic efficiency and equipment. The effect of low requirements and short production process

Active Publication Date: 2013-02-27
JIANGYIN RUNMA ELECTRONICS MATERIAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] At present, the method of producing ultra-clean and high-purity phosphoric acid is mainly the yellow phosphorus combustion method or the physical purification method. In the yellow phosphorus combustion method, a large amount of phosphorus will be lost when the yellow phosphorus is burned. The purification method mainly adopts the crystallization method, which is simple to operate, but requires multiple crystallization, which cannot achieve the purpose of efficient impurity removal, and the production efficiency is low, which is not conducive to the improvement of economic benefits in large-scale industrial production

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] An ultra-clean high-purity phosphoric acid process, which is characterized in that the specific steps are as follows:

[0022] In the first pretreatment step, an impurity remover is added to the raw phosphoric acid, and the weight ratio of the added amount of the impurity remover to the raw phosphoric acid is 4:100 for preliminary impurity removal. The impurity remover is polymeric ferric sulfate;

[0023] In the second step of rectification, the raw material phosphoric acid after removal of impurities is injected into the high-level tank with negative pressure, and then the raw material acid in the high-level tank is added to the rectification kettle with built-in heater through the conduit and the feed valve to the junction of the bumping ball ±20mm, and maintain the liquid level. After the equipment normally discharges acid, open the inlet valve to replenish the raw material acid and keep the acid inlet and outlet basically equal;

[0024] The third step is the initial cont...

Embodiment 2

[0034] On the basis of Embodiment 1, the preferred technical solution of the present invention is:

[0035] The mass ratio of the impurity remover added in the pretreatment step to the raw material phosphoric acid is 6:100.

[0036] The temperatures of the three components in the initial control classification of high boiling point, medium boiling point and low boiling point are 270, 261, and 248 respectively.

[0037] In the mixing process, the concentration of the prepared solution is 45%.

[0038] The speed of the rectification is controlled by an online flow meter to produce 1.6L of acid per hour.

Embodiment 3

[0040] On the basis of Embodiment 1, the preferred technical solution of the present invention is:

[0041] The mass ratio of the impurity removing agent added in the pretreatment step to the raw material phosphoric acid is 9:100.

[0042] The temperatures of the three components in the initial control classification of high boiling point, medium boiling point and low boiling point are 275, 262, and 255, respectively.

[0043] In the mixing process, the concentration of the prepared solution is: 60%.

[0044] The rate of the rectification is controlled by an online flow meter to produce 2L of acid per hour.

[0045] The nature and use of this ultra-clean and high-purity phosphoric acid product.

[0046] Name: Phosphoric Acid

[0047] Structural formula: H 3 PO 4

[0048] Colorless, transparent, viscous and slightly thick liquid, miscible with water and alcohol, and at the same time emit a lot of heat, can carbonize organic substances such as paper and cloth, boiling point 260℃, specific gr...

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Abstract

The present invention discloses a super-clean high-purity phosphoric acid production process. Concrete steps of the method comprise: 1, pre-treating: an impurity removing agent is added to analytically pure phosphoric acid according to a certain ratio; 2, rectifying: the impurify-removed phosphoric acid is added to a rectifying kettle by an entering valve to carry out heating, when the phosphoric acid is normally discharged from the device, the entering valve is opened, the raw material acid is supplied, such that the balance of the acid entering and the acid discharging is maintained, wherein a heater is arranged inside the rectifying kettle; 3, primary control grading: after the rectifying is performed normally, three components of a high boiling point component, a middle boiling point component and a low boiling point component are respectively fractionated; 4, blending: the resulting middle boiling point finished acid from the primary control grading is blended with deionized water into a solution, wherein the concentration of the solution is 30-60%; 5, filtering and subpackaging: the blended finished acid is filtered by a filter, and then is subpackaged. The process of the present invention has characteristics of low production cost, high impurity removal efficiency, and large economic benefits.

Description

Technical field [0001] The invention relates to a production process of phosphoric acid, in particular to a production process of ultra-clean high-purity phosphoric acid used for wet cleaning and wet etching in the production of electronic products. Background technique [0002] For a long time, my country's semiconductor manufacturing related materials have been heavily dependent on imports, and self-developed products are very scarce. In particular, high-purity electronic chemicals basically rely on imports for their major market shares. Ultra-clean high-purity phosphoric acid, as a high value-added fine phosphorous chemical product, is widely used in large-scale, ultra-large-scale integrated circuits, liquid crystal displays and other electronic products. It is mainly used for wet cleaning and wet etching of chips. Clean the cations in the acid. Its cleanliness has an important influence on the electrical performance, yield and reliability of integrated circuits. With the ra...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B25/234
Inventor 戈士勇
Owner JIANGYIN RUNMA ELECTRONICS MATERIAL