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Photosensitive Resin Composition For Forming Spacer, Spacer Manufactured By The Same For Display Device, And Display Device With The Spacer

A technology of photosensitive resin and composition, applied in photosensitive materials for optomechanical equipment, optomechanical equipment, optics, etc., can solve the problem of not showing hard characteristics and so on

Active Publication Date: 2012-07-11
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the case of the conventional photosensitive resin composition for forming a spacer, although the elastic recovery rate is sufficiently exhibited, it is not exhibited to a satisfactory degree, and there is no occurrence of deformation caused by external pressure. The hard nature of pixel warping

Method used

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  • Photosensitive Resin Composition For Forming Spacer, Spacer Manufactured By The Same For Display Device, And Display Device With The Spacer
  • Photosensitive Resin Composition For Forming Spacer, Spacer Manufactured By The Same For Display Device, And Display Device With The Spacer
  • Photosensitive Resin Composition For Forming Spacer, Spacer Manufactured By The Same For Display Device, And Display Device With The Spacer

Examples

Experimental program
Comparison scheme
Effect test

Synthetic example 1

[0314] Synthesis of Unsaturated Group-Containing First Resin A

[0315] 182 g of propylene glycol monomethyl ether hexanoate was introduced into a flask equipped with a stirrer, a thermometer, a reflux condenser, a dropping funnel, and a nitrogen gas introduction tube, and after replacing the atmosphere in the flask with air, the temperature was raised to 100° C., and then The following solution was added dropwise to the flask through the dropping funnel for 2 hours, that is, to the flask containing 47.2 g (0.40 moles) of vinyl toluene, 43.0 g (0.50 moles) of methacrylic acid, 2-hydroxypropyl dehydroabietic acid acrylate [Bimset 101 manufactured by Arakawa Chemical Co., Ltd.] A solution of 3.6 g of azobisisobutyronitrile was added to a mixture of 44.5 g (0.10 mol) and 136 g of propylene glycol monomethyl ether acetate, and the stirring was continued at 100°C 5 hours. Next, after replacing the atmosphere in the flask from nitrogen to air, 30 g [0.20 mol] of glycidyl acrylate ...

Synthetic example 2

[0318] Synthesis of Unsaturated Group-Containing First Resin B

[0319] 182 g of propylene glycol monomethyl ether hexanoate was introduced into a flask equipped with a stirrer, a thermometer, a reflux condenser, a dropping funnel, and a nitrogen gas introduction tube, and after replacing the atmosphere in the flask with air, the temperature was raised to 100° C., and then The following solution was added dropwise to the flask through the dropping funnel for 2 hours, that is, to the flask containing 35.4 g (0.30 moles) of vinyltoluene, 36.0 g (0.50 moles) of acrylic acid, 2-hydroxypropyl dehydroabietic acid acrylate [Arakawa A solution of 3.6 g of azobisisobutyronitrile was added to a mixture of 89.0 g (0.20 mole) of Biimset 101 manufactured by Kagami Corporation and 136 g of propylene glycol monomethyl ether acetate, and stirring was continued at 100°C for 5 hours. . Next, after replacing the atmosphere in the flask from nitrogen to air, 22.5 g [0.15 mol] of glycidyl acryla...

Synthetic example 3

[0320] Synthesis of Unsaturated Group-Containing Second Resin C

[0321] 182 g of propylene glycol monomethyl ether hexanoate was introduced into a flask equipped with a stirrer, a thermometer, a reflux condenser, a dropping funnel, and a nitrogen gas introduction tube, and after replacing the atmosphere in the flask with air, the temperature was raised to 70° C., and then Add the following solution dropwise to the flask through the dropping funnel in 2 hours, that is, to the flask containing 60.0 g (0.25 moles) of methacrylic acid, 4-epoxy tricyclo [5.2.1.02.6] decyl acrylate ( [5.2.1.02.6] ) 240.0 g [0.75 mol (mixture of compounds represented by formula 11 and formula 26 in a molar ratio of 50:50)] and 136 g of propylene glycol monomethyl ether acetate added 3.6 g of azobisisobutyronitrile solution, and continued to stir at 70°C for another 4 hours. Thus, the unsaturated group-containing first resin D having a solid content acid value of 110 mgkOH / g was obtained. The...

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Abstract

The present invention provides a photosensitive resin composition for forming a spacer, a spacer which is manufactured by the photosensitive resin composition for a display device, and the display device with the spacer. The photosensitive resin composition for forming the spacer has an elastic recovery ratio which is similar with the prior-art spacer and a rigid characteristic with smaller deformation caused by outer stress. Furthermore the photosensitive resin composition comprises a first resin with unsaturated groups. The first resin is obtained through causing a copolymer to react with (A-14), wherein the copolymer is obtained through copolymerization of a compound which comprises (A-11)-(A-13), (A-11) is a compound which is represented by a chemical formula 1, (A-12) is a compound which can copolymerize with (A-11) and (A-13) and has unsaturated bonds; (A-13) is carboxylic acid with unsaturated bonds and carboxyls; (A-14) is a compound which is provided with unsaturated bonds and epoxy groups in one module. In a chemical formula 1, R1 represents hydrogen atom, alkyl, allyl, phenyl, benzyl, halogen atom or alkoxy, R2 is hydrogen atom, hydroxyl, alkyl or alkoxy.

Description

technical field [0001] The present invention relates to a photosensitive resin composition for spacer formation, a spacer for a display device manufactured using the photosensitive resin composition for spacer formation, and a display device including the spacer for a display device. Background technique [0002] In a general display device, in order to maintain a constant distance between the upper and lower substrates, silica beads or plastic beads having a constant diameter are used. However, when these glass beads are randomly dispersed on the substrate and located inside a pixel (pixel), there is a problem that the aperture ratio decreases and light leakage occurs. In order to solve such problems, spacers formed by photolithography have been used inside display devices, and spacers currently used in most display devices are formed by photolithography. [0003] The formation method of the spacer by photolithography is as follows, that is, coating photosensitive resin co...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004G03F7/033G03F7/00G02F1/1339
CPCG02F1/1339G03F7/028G02F1/13398
Inventor 崔和燮金成洙
Owner DONGWOO FINE CHEM CO LTD