Method for manufacturing contactless conductivity detection microchip of integrated thickness controllable insulation layer
A technology of non-contact conductance and manufacturing method, which is applied in the fields of medicine, life science, microfluidic chip, and analytical chemistry, and can solve the problem of uncontrollable thickness of the insulating layer, and achieve the effect of low cost, simple manufacturing process, and precise thickness control
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[0020] as attached figure 1 shown in German The model of Delta 80RC produced by MicroTec Co., Ltd. spin-coats a layer of positive photoresist produced by Beijing Kehua Microelectronics Materials Co., Ltd. on the surface of the glass slide. Low speed 550rpm, time 9 seconds; high speed 2200rpm, time 30 seconds, and pre-baked on a hot plate at 55°C for 1 hour, and then covered the mask on the photoresist, using German The model produced by MicroTec Company is the UV lithography machine of MA / BA6, which exposes the photoresist for 40 seconds, puts it into the developing solution and develops it, and then obtains a photoresist pattern with a width of micron ( figure 1 -④), then put it on a hot plate at 55 ℃ and bake for 20 minutes; then put it into the magnetron sputtering station of LAB.18 produced by Kunt J.Lesker Company to sputter the platinum film, because platinum and The bonding force of glass is not good, so we first sputter a layer of Ti, about 30nm, and then sputter 9...
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