Cleaning machine with supporting and thrusting mechanism

Abstract

The invention discloses a cleaning machine with a supporting and thrusting mechanism, which comprises a rack and a plurality of cleaning tanks, wherein a lifting bracket used for supporting material baskets is arranged in each cleaning tank; at least one side edge of each lifting bracket is connected with a lifting cross beam through a bracket connecting rod; a lifting driving mechanism mounted on the rack can drive the lifting brackets to be lifted to and fro in the vertical direction through the lifting cross beam; horizontal material basket push rods used for horizontally pushing the material baskets to move are further arranged above the cleaning tanks and are driven by a horizontal driving mechanism; fixed brackets are fixedly arranged between adjacent cleaning tanks; upper bearing surfaces of the fixed brackets are positioned in the same bearing plane as bearing surfaces of the lifting brackets lifted to high positions; and the bearing plane is higher than tank openings of the cleaning tanks. The cleaning machine has the advantages of stability and reasonableness in structure and great carrying capacity; and particularly, a cleaning and conveying path of the cleaning machine is reasonable, the effective cleaning time is long and the work efficiency is high.

Description

technical field [0001] The invention relates to manufacturing equipment in the semiconductor and solar energy industries, in particular to a tank-type cleaning machine for materials such as silicon materials and silicon wafers. Background technique [0002] Cleaning of silicon materials and silicon wafers is an important link in the manufacturing process of silicon materials in the solar energy industry and the semiconductor industry. Its purpose is to remove metal ion pollution, organic pollution or particle pollution on the surface of silicon materials or silicon wafers, thereby ensuring its purity and product quality. [0003] The silicon material and silicon wafer cleaning machine is mainly composed of a cleaning tank installed on the frame, a cleaning liquid pipeline system, an ultrasonic system, a heating system, a cleaning throwing device, a material basket conveying system and an electric control part. The material basket is used to carry the silicon wafers and sili...

AI Technical Summary

Problems solved by technology

The conveying devices of all the material baskets in this structure are located above the cleaning tank, which still has the disadvantages of high center of gravity, unstable structure, and weak bearing capacity. In this structure, the weight of all materials and the weight of the conveying device need a It is supported by a strong bracket; and the conveying transmission device located above each cleaning tank must adopt a steel structure due to the heavy load

And this structural form also needs to complete several actions of material basket grabbing, lifting, horizontal transfer, lowering, and basket placement every time the material basket is conveyed. The proportion of effective cleaning time in the production cycle is not high, and the work efficiency is not high. high problem

At the same time, in the process of exercise, fine particles caused by motion friction and volatile substances caused by lubricant will inevitably be produced, which will just fall into the cleaning tank below it, so it is difficult to take protective measures for protection, so as to protect the Materials that need to be cleaned cause new pollution, which is absolutely not allowed in this industry

[0005] Therefore, in the existing structure, the conveying mechanism of the washing machine always realizes a series of actions such as hooking, lifting and moving the material basket from above the material basket. The high center of gravity of the conveying transfer and insufficient carrying capacity restrict cleaning. The cleaning volume of the washing machine increases; moreover, due to the above grabbing form, the conveying path is long, and the conveying mechanism inevitably has an empty return stroke and empty return time, which takes up more effective conveying and actual cleaning time, which seriously limits the washing machine. With the improvement of work efficiency, the industry has been looking for a silicon material and silicon wafer cleaning equipment with large cleaning capacity and high operating efficiency.

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