Ni-base NiO nanosheet array film electrode and preparation method thereof
A technology of nanosheet array and thin film electrode, which is applied in the field of Ni-based NiO nanosheet array thin film electrode and its preparation, which can solve the problem of poor bonding between NiO electrode and Ni substrate, poor bonding force between NiO film and substrate, and inability to form large-scale films and other problems, to achieve the effect of reducing electron transfer impedance and electrochemical reaction impedance, excellent electrochemical performance, and low equipment requirements
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Embodiment 1
[0028] The Ni-based NiO nanosheet array film electrode of this embodiment consists of a Ni substrate and a NiO film covering the surface of the Ni substrate, and the NiO film is composed of NiO nanosheet arrays grown in situ perpendicular to the surface of the Ni substrate. The NiO nanosheets have a hexagonal sheet structure, the thickness of the NiO nanosheets is 20-25 nm, and the side length is 0.5-2.0 μm.
[0029] The preparation method of the Ni-based NiO nanosheet array film electrode of the present embodiment comprises the following steps:
[0030] Step 1. Process the Ni matrix with a mass purity of 99.99% into a sheet shape with a length of 30mm, a width of 20mm, and a thickness of 1mm, and use 150#, 600#, and 1000# sandpaper to polish and polish in turn, and then place it in an organic Ultrasonic degreasing in a solvent, then cleaning with deionized water, and drying naturally to obtain a pretreated Ni matrix; the organic solvent is preferably anhydrous methanol, absol...
Embodiment 2
[0036] The Ni-based NiO nanosheet array film electrode of this embodiment consists of a Ni substrate and a NiO film covering the surface of the Ni substrate, and the NiO film is composed of NiO nanosheet arrays grown in situ perpendicular to the surface of the Ni substrate. The NiO nanosheets have a hexagonal sheet structure, the thickness of the NiO nanosheets is 20-25 nm, and the side length is 0.5-2.0 μm.
[0037] The preparation method of the Ni-based NiO nanosheet array film electrode of the present embodiment comprises the following steps:
[0038]Step 1. Process the Ni matrix with a mass purity of 99.8% into a sheet with a length of 10mm, a width of 10mm, and a thickness of 0.1mm, and use 150#, 600#, and 1000# sandpaper to polish and polish it in sequence, and then place it in the Ultrasonic degreasing in an organic solvent, then cleaning with deionized water, and drying naturally to obtain a pretreated Ni matrix; the organic solvent is preferably anhydrous methanol, ab...
Embodiment 3
[0042] The Ni-based NiO nanosheet array film electrode of this embodiment consists of a Ni substrate and a NiO film covering the surface of the Ni substrate, and the NiO film is composed of NiO nanosheet arrays grown in situ perpendicular to the surface of the Ni substrate. The NiO nanosheets have a hexagonal sheet structure, the thickness of the NiO nanosheets is 20-25 nm, and the side length is 0.5-2.0 μm.
[0043] The preparation method of the Ni-based NiO nanosheet array film electrode of the present embodiment comprises the following steps:
[0044] Step 1. Process the Ni matrix with a mass purity of 99.9% into a sheet with a length of 40mm, a width of 30mm, and a thickness of 3mm. Use 150#, 600#, and 1000# sandpaper to polish and polish in turn, and then place it in an organic Ultrasonic degreasing in a solvent, then cleaning with deionized water, and drying naturally to obtain a pretreated Ni matrix; the organic solvent is preferably anhydrous methanol, absolute ethanol...
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Abstract
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