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Ni-base NiO nanosheet array film electrode and preparation method thereof

A technology of nanosheet array and thin film electrode, which is applied in the field of Ni-based NiO nanosheet array thin film electrode and its preparation, which can solve the problem of poor bonding between NiO electrode and Ni substrate, poor bonding force between NiO film and substrate, and inability to form large-scale films and other problems, to achieve the effect of reducing electron transfer impedance and electrochemical reaction impedance, excellent electrochemical performance, and low equipment requirements

Active Publication Date: 2014-07-02
NORTHWEST INSTITUTE FOR NON-FERROUS METAL RESEARCH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The advantage of using these methods is that the electroactive material NiO can be directly obtained on the substrate, which effectively avoids the cumbersome steps of mixing and pressing powder materials to prepare electrodes, but there are also the following defects: (1) The electrochemical deposition method requires the process The conditions (such as the voltage used for deposition, current density, etc.) are precisely controlled, and there are problems such as the inability to form a large-scale film and the poor bonding force between the obtained NiO film and the substrate; (2) the NiO film obtained by the sol-gel method is In addition to the defect of poor bonding force, there are also problems such as cracking during the heat treatment of the gel
[0006] Therefore, how to make up for the shortcomings of the existing preparation methods such as complex process, high equipment requirements, and inability to form large-scale films, and overcome the lack of tight bonding between the NiO electrode and the Ni matrix, small specific surface area, low porosity, short service life, and electrochemical For defects such as low activity, it is an important key to realize industrial production to find a Ni-based crystalline NiO electrode material with simple preparation method, high specific surface area, developed pores, firm combination with the substrate, and excellent electrochemical performance.

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  • Ni-base NiO nanosheet array film electrode and preparation method thereof
  • Ni-base NiO nanosheet array film electrode and preparation method thereof

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Embodiment 1

[0028] The Ni-based NiO nanosheet array film electrode of this embodiment consists of a Ni substrate and a NiO film covering the surface of the Ni substrate, and the NiO film is composed of NiO nanosheet arrays grown in situ perpendicular to the surface of the Ni substrate. The NiO nanosheets have a hexagonal sheet structure, the thickness of the NiO nanosheets is 20-25 nm, and the side length is 0.5-2.0 μm.

[0029] The preparation method of the Ni-based NiO nanosheet array film electrode of the present embodiment comprises the following steps:

[0030] Step 1. Process the Ni matrix with a mass purity of 99.99% into a sheet shape with a length of 30mm, a width of 20mm, and a thickness of 1mm, and use 150#, 600#, and 1000# sandpaper to polish and polish in turn, and then place it in an organic Ultrasonic degreasing in a solvent, then cleaning with deionized water, and drying naturally to obtain a pretreated Ni matrix; the organic solvent is preferably anhydrous methanol, absol...

Embodiment 2

[0036] The Ni-based NiO nanosheet array film electrode of this embodiment consists of a Ni substrate and a NiO film covering the surface of the Ni substrate, and the NiO film is composed of NiO nanosheet arrays grown in situ perpendicular to the surface of the Ni substrate. The NiO nanosheets have a hexagonal sheet structure, the thickness of the NiO nanosheets is 20-25 nm, and the side length is 0.5-2.0 μm.

[0037] The preparation method of the Ni-based NiO nanosheet array film electrode of the present embodiment comprises the following steps:

[0038]Step 1. Process the Ni matrix with a mass purity of 99.8% into a sheet with a length of 10mm, a width of 10mm, and a thickness of 0.1mm, and use 150#, 600#, and 1000# sandpaper to polish and polish it in sequence, and then place it in the Ultrasonic degreasing in an organic solvent, then cleaning with deionized water, and drying naturally to obtain a pretreated Ni matrix; the organic solvent is preferably anhydrous methanol, ab...

Embodiment 3

[0042] The Ni-based NiO nanosheet array film electrode of this embodiment consists of a Ni substrate and a NiO film covering the surface of the Ni substrate, and the NiO film is composed of NiO nanosheet arrays grown in situ perpendicular to the surface of the Ni substrate. The NiO nanosheets have a hexagonal sheet structure, the thickness of the NiO nanosheets is 20-25 nm, and the side length is 0.5-2.0 μm.

[0043] The preparation method of the Ni-based NiO nanosheet array film electrode of the present embodiment comprises the following steps:

[0044] Step 1. Process the Ni matrix with a mass purity of 99.9% into a sheet with a length of 40mm, a width of 30mm, and a thickness of 3mm. Use 150#, 600#, and 1000# sandpaper to polish and polish in turn, and then place it in an organic Ultrasonic degreasing in a solvent, then cleaning with deionized water, and drying naturally to obtain a pretreated Ni matrix; the organic solvent is preferably anhydrous methanol, absolute ethanol...

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Abstract

The invention provides an Ni-base NiO nanosheet array film electrode, which consists of a Ni matrix and a NiO film which covers the surface of the Ni matrix, wherein the NiO film consists of a NiO nanosheet array which grows in situ and is perpendicular to the surface of the Ni matrix; and the NiO nanosheet has a hexagonal laminated structure. The invention also provides a method for preparing the electrode. The method comprises the following steps of: 1, pretreating the Ni matrix; 2, anodizing the pretreated Ni matrix to obtain a Ni-base NiO porous film; and 3, performing steam heat treatment on the Ni-base NiO porous film to obtain the Ni-base NiO nanosheet array film electrode. According to the Ni-base NiO nanosheet array film electrode, a preparation process is simple, a process flow is short, and the production efficiency is high; and the Ni-base NiO nanosheet array film electrode is large in specific surface area and advanced in pore structure, and has the high electrochemical performance and circular stabile performance.

Description

technical field [0001] The invention belongs to the technical field of inorganic nanometer materials, and in particular relates to a Ni-based NiO nanosheet array film electrode and a preparation method thereof. Background technique [0002] Due to its wide source, environmental friendliness, and excellent electrochemical performance, NiO has broad application prospects in the fields of electrocatalysis and supercapacitors. NiO electrodes can be divided into powder electrodes and thin film electrodes according to their existing forms. The scraper method is often used to make NiO powder materials into electrodes, which is to uniformly mix the NiO powder materials prepared by various methods with conductive agents and binders, and perform slurry treatment to make preforms, and then use The preform and the current collector substrate (usually foamed Ni) are bonded by the knife coating method, and then pressed (the usual pressure is 20MPa), and the electrode sheet is obtained af...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C25D11/34B32B15/04B32B9/04
Inventor 李纲张文彦李广忠
Owner NORTHWEST INSTITUTE FOR NON-FERROUS METAL RESEARCH