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System and method for quantitatively detecting impurities in sulfur hexafluoride gas

A technology for quantitative detection of sulfur hexafluoride gas is applied in a system for quantitatively detecting impurities in sulfur hexafluoride gas, and in the field of quantitative detection of impurities in sulfur hexafluoride gas, which can solve problems such as those not mentioned, and achieve rapid detection, High sensitivity, good response linearity

Active Publication Date: 2013-01-16
ZHONGHAO CHENGUANG RES INST OF CHEMICALINDUSTRY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The problem is that the literature only analyzes sulfur hexafluoride by gas chromatography-mass spectrometry, and detects that it contains 14 trace impurities, but does not involve any quantitative technology for impurities, and the article does not include mention that C 2 f 6 with SF 6 complete separation

Method used

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  • System and method for quantitatively detecting impurities in sulfur hexafluoride gas
  • System and method for quantitatively detecting impurities in sulfur hexafluoride gas
  • System and method for quantitatively detecting impurities in sulfur hexafluoride gas

Examples

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Embodiment 1

[0048] This embodiment uses the detection system and method of the present invention to detect SF 6 Cylinder gas, quantitative analysis of air, fluorocarbon and sulfur-containing fluoride impurities.

[0049] 1. Detection system

[0050] GC-MS model: Agilent 6890-5973N.

[0051] Equipped with double-column, double-detector parallel device: injector six-way valve 1 (the through-way valve and its deactivation pipeline are placed in a valve box 2; the six-way valve is connected with the carrier gas flow path and the exhaust port, and the load There is also an electronic flow controller 4 in the gas flow path, and a quantitative loop 3) between the inlet 5 and the exhaust port 6 of the six-way valve, and an adjustable outlet splitter 8 is connected to it, and the flow from the adjustable outlet is divided. There are two paths separated by 8 at the device, and one path is the chromatographic column HP-PLOT Al connected in series in sequence. 2 o 3 M 10 and mass spectrometry det...

Embodiment 2

[0073] In this example, high-purity SF with a known air content of 49ppm (predetermined in accordance with GB / T12022-2006 "Industrial Sulfur Hexafluoride") is used in the laboratory. 6 The experimental gas is used as a standard gas, and the system and method of the present invention (conditions are the same as in Example 1) are used to detect standard SF 6 The air content in the gas is then determined in the method of the invention relative to the SF of the air 6 The correction factor for the gas.

[0074] Carry out three consecutive sampling analysis, and use the following formula to convert the relative SF of air 6 Gas correction factor: ωi=100fiAi / ∑(fiAi)(i=1,2,3…)

[0075] ωi——volume percent concentration of component i

[0076] fi——correction factor of component i

[0077] Ai——peak area of ​​component i

[0078] Specify SF 6 A correction factor of 1 yields the relative SF of air 6 The correction factor is 0.43, see the table below for details:

[0079]

Embodiment 3

[0081] The present embodiment adopts that the air content in the laboratory is 334ppm, C 3 f 8 The content is 11.20ppm, SO 2 f 2 The content is 6.73ppm, S 2 f 10 The SF6 experimental gas with an O content of 9.31ppm is used as the standard experimental gas (collect pure impurity gas by laboratory means, and then add it to high-purity sulfur hexafluoride gas, so that the standard sulfur hexafluoride gas with known impurity content is obtained ), with the system and method of the present invention (conditions are the same as in Example 1) to detect standard SF 6 Air in gases, fluorocarbons and sulfur-containing fluorides. Considering that it is difficult to use highly toxic pure samples as quantitative standard samples in actual analysis and testing, we use the pressure gas distribution method to use helium to test the laboratory standard SF 6 The experimental gas is accurately diluted, and the dilution ratios (V / V) are 0, 2, 5, 10, and 20 times respectively, and the quant...

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Abstract

The invention relates to a system for quantitatively detecting impurities in sulfur hexafluoride gas and a method for quantitatively detecting the impurities in the sulfur hexafluoride gas by using the system. A detector in the system is a gas chromatography and mass spectrometer. The system is characterized in that a double-column and double-detector parallel connection device is involved; the structure of the double-column and double-detector parallel connection device is that a six-way valve is a sample injector; an adjustable outlet flow divider is connected behind the six-way valve; two passages are divided from the adjustable outlet flow divider; one passage comprises a chromatographic column HP-PLOT Al2O3M and a mass spectrum detector which are sequentially connected in series with each other; the other passage comprises a capillary chromatographic column GS-CarbonPLOT and a heat conduction detector which are sequentially connected in series with each other; and the two passages are connected in parallel with each other. Under the condition, the system is extremely high in separability and relatively high in sensitivity in detecting air, fluorocarbon and the impurities with sulfur fluoride in the sulfur hexafluoride gas; and in total, the system is extremely high in application and popularization value.

Description

technical field [0001] The invention relates to the field of impurity detection, in particular to a system for quantitatively detecting impurities in sulfur hexafluoride gas, and a method for quantitatively detecting impurities in sulfur hexafluoride gas using the system. Background technique [0002] Sulfur hexafluoride (SF 6 ) gas has non-combustible, excellent insulation properties and arc extinguishing properties, and is currently widely used in high-voltage / ultra-high voltage / ultra-high voltage electrical appliances (such as: circuit breakers, GIS, etc.). Although SF 6 The chemical properties of the gas are extremely stable and its pure gas is non-toxic and harmless, but certain impurities are often brought in during production and use. In addition, it will decompose itself under the action of high-power arc shock, high temperature, high-energy ions, etc. and can be combined with other Impurities react to produce several products. Some of the impurity components are ...

Claims

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Application Information

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IPC IPC(8): G01N30/02
Inventor 蔡醇洋贺颖
Owner ZHONGHAO CHENGUANG RES INST OF CHEMICALINDUSTRY CO LTD
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