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Method for preparing crystalline silicon battery back electrode by laser sintering

A crystalline silicon battery and laser sintering technology, which is applied to circuits, electrical components, semiconductor devices, etc., can solve the problems of material waste and high production costs, and achieve the effects of saving electrode materials, simplifying the sintering process, and improving yield

Inactive Publication Date: 2013-01-16
刘莹
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The aluminum paste or silver-aluminum paste used in silk screen printing has become very scarce with the expansion of crystalline silicon production, resulting in higher production costs
At the same time, the thickness of the electrode during silk screen printing is much larger than that required for the back electrode, which is also a waste of material

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0019] In this embodiment, a 125×125 crystalline silicon wafer is selected, and goes through various processes such as texturing, passivation, and doping to the back electrode manufacturing process. Send the clean crystalline silicon wafer into the aluminum evaporation equipment, and use the crucible electron gun to evaporate the aluminum wire to evaporate the aluminum on its back surface. The thickness of the evaporated aluminum is about 1.5μ. Then take out the crystalline silicon wafer and send it to the platform of the laser heating equipment that can be vacuumed. superior. Preheat the silicon wafer at 350°C while vacuuming, when the vacuum reaches 5.0×10 -3 Pa, after the substrate reaches the preheating temperature for 10 minutes, turn on the continuous solid-state laser to heat the substrate, so that the surface temperature of the substrate reaches 1000°C and maintain it for about 30 seconds. At this time, the electric field of the back electrode of the silicon wafer is f...

Embodiment 2

[0022] In this embodiment, a 156×156 crystalline silicon wafer is selected. After going through various processes such as texturing, passivation, and doping to the back electrode manufacturing process, the crystalline silicon wafer is sent into a sputtering-type aluminum-coated vacuum chamber, and the crystalline silicon wafer is While coating the back surface of the solar cell with an aluminum film, a background temperature of 200°C is applied to the silicon wafer to control the coating thickness to about 1 μ. Then take out the crystalline silicon wafer and send it to the platform of the vacuumable laser heating equipment. Preheat the silicon wafer at 400°C while vacuuming, when the vacuum reaches 5.0×10 -3 Pa, after the substrate reaches the preheating temperature for 10 minutes, turn on the continuous solid-state laser to heat the substrate, so that the surface temperature of the substrate reaches 1000°C and maintain it for about 20 seconds. At this time, the electric field...

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PUM

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Abstract

The invention discloses a method for preparing a crystalline silicon battery back electrode by laser sintering. According to the method, an aluminium-coated film and a laser sintering back electric field are involved, wherein the aluminium-coated film is a sputtering coated film or an evaporated coated film; the thickness of the film is controlled between 0.5 to 2.0 mu; laser sintering is executed by a continuous solid laser device; in a vacuum environment, the back electric field is formed; and during laser sintering, a substrate has basic temperature of 0 to 500 DEG C. By the non-contact method for preparing the crystalline silicon battery back electrode, the fragment rate is reduced, the waste of electrode materials is reduced, an automatic production line is easy to form, and large-scale production is facilitated.

Description

technical field [0001] The invention belongs to the field of crystalline silicon solar cell manufacturing, and is particularly suitable for a method for preparing a back electrode of a crystalline silicon cell by laser sintering. Background technique [0002] Crystalline silicon solar cells are the mainstream products in the industrialization of solar cells at present, and screen printing followed by sintering is a typical process for preparing the back electrode. This process has high requirements for screen printing equipment. So far, most of the equipment selected by domestic solar cell manufacturers are foreign equipment. Even so, this process is still the process with the highest fragmentation rate, which is extremely critical to the yield of solar cells. [0003] The aluminum paste or silver-aluminum paste used in silk screen printing has also become very scarce with the expansion of crystalline silicon production, resulting in higher production costs. At the same ti...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/268H01L31/18
CPCY02P70/50Y02P80/30
Inventor 刘莹
Owner 刘莹