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Silicon-based heterojunction solar cell and preparation method thereof

A solar cell and heterojunction technology, applied in the field of solar cells, can solve the problems of small difference in refractive index, difficulty in current collection, poor use effect, etc., and achieve small series resistance, good reflection effect, and high photoelectric conversion efficiency Effect

Active Publication Date: 2013-02-13
(CNBM) BENGBU DESIGN & RES INST FOR GLASS IND CO LTD +1
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the existing distributed Bragg reflector is composed of transparent conductive films and semiconductor thin films with different refractive indices from the transparent conductive films. Its resistivity is too large and its conductivity is not good. When the back reflection electrode of thin film silicon / crystalline silicon heterojunction cells is used, the actual use effect is not good
In the prior art, there is no transparent conductive film for both layers, because the refractive index of the two materials is required to be different, and the existing transparent conductive film has little difference in refractive index, which can be considered the same

Method used

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  • Silicon-based heterojunction solar cell and preparation method thereof
  • Silicon-based heterojunction solar cell and preparation method thereof

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Embodiment Construction

[0024] The present invention will be described in detail below in conjunction with the accompanying drawings.

[0025] see figure 1 As shown, a silicon-based heterojunction solar cell provided by the present invention sequentially includes a gate electrode 5, a transparent conductive film 4, a boron-doped amorphous silicon 3, an intrinsic amorphous silicon 2, and an N-type single crystal silicon 1 and the back electrode, the back electrode is composed of a distributed Bragg reflector and an aluminum thin film 8, the distributed Bragg reflector is composed of a niobium-doped titanium dioxide thin film 6 and an aluminum-doped zinc oxide thin film 7, and the aluminum thin film 8 is arranged at the end of the distributed Bragg reflector. The surface layer of the outer transparent aluminum-doped zinc oxide film. A layer of niobium-doped titanium dioxide film and a layer of aluminum-doped zinc oxide film form a periodic structure, forming a pair of distributed Bragg reflectors, an...

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Abstract

The invention discloses a silicon-based heterojunction solar cell which comprises grid electrodes, a transparent conductive film, a boron-doped amorphous silicon, an intrinsic amorphous silicon, an N-type monocrystalline and a back electrode in sequence, wherein the back electrode is formed by a distributed Bragg reflector and an aluminum thin film, the distributed Bragg reflector is formed by arranging niobium-doped titanium dioxide thin films and aluminum-doped zinc oxide thin films at intervals, and the aluminum thin film is arranged on the surface layer of the aluminum-doped zinc oxide thin film on the outermost layer of the distributed Bragg reflector. The distributed Bragg reflector used as the back electrode consists of two transparent conductive films with different refraction indexes, so that the resistance of the cell device connected in series is reduced, the collection of current carriers is facilitated, and the photoelectric conversion efficiency of the cell is high; and by adopting the back-reflecting electrode formed by combining the distributed Bragg reflector and the aluminum anode, the long wave band of the near infrared part with characteristic wavelength can be reflected to the inside of the crystalline silicon wafer to be reabsorbed through the two layers of conductive films with different refractive indexes, so that both the current and the photoelectric conversion efficiency of the cell are improved.

Description

technical field [0001] The invention relates to the technical field of solar cells, in particular to a thin-film silicon / crystalline silicon heterojunction cell with a high back reflection electrode and a preparation method thereof. Background technique [0002] Thin-film silicon / crystalline silicon heterojunction solar cells combine the advantages of thin-film solar cells and crystalline silicon solar cells, and have excellent application prospects. Based on crystalline silicon wafers as photoelectric absorption layers, they have high current density and good photoelectric conversion stability. The preparation process is mainly a low-temperature process in the process of thin-film solar cells, so that compared with the high-temperature process of crystalline silicon preparation, its cost can be effectively controlled at a low level. In addition, the photoelectric conversion efficiency of the heterojunction cell is much higher than that of thin-film The solar cell needs to b...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/0747H01L31/0224H01L31/18H01L31/20
CPCY02E10/50Y02P70/50
Inventor 彭寿马立云崔介东陈思达
Owner (CNBM) BENGBU DESIGN & RES INST FOR GLASS IND CO LTD
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