Surface treatment method for binary pseudo-alloy electronic packaging material
An electronic packaging material and surface treatment technology, applied in metal material coating process, ion implantation plating, liquid chemical plating, etc. The effect of high rate and simple process
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Embodiment 1
[0011] Example 1, Nickel Plating on Aluminum Silicon Carbide (Silicon Carbide Aluminum) Substrate
[0012] 1. Surface cleaning, degreasing and decontamination;
[0013] 2. Vacuum sputtering 0.1-2um aluminum on the surface of the aluminum silicon carbide substrate, annealing at 400-500 degrees, the aluminum layer on the surface is fused with the metal aluminum in the aluminum silicon carbide substrate to form a complete metal surface;
[0014] 3. Electro(chemical) nickel plating 2-5um, annealing at 850 degrees.
[0015] After the implementation of the above process, the qualified rate of nickel plating can reach more than 98%, and the surface will not be blistered or peeled.
Embodiment 2
[0016] Embodiment 2, nickel-plated tungsten-copper substrate
[0017] 1. Surface cleaning, degreasing and decontamination;
[0018] 2. Vacuum sputtering 2-4um copper on the surface of tungsten-copper substrate, annealing at 400-500 degrees, the copper layer on the surface is fused with the metal copper in the tungsten-copper substrate to form a complete metal surface;
[0019] 3. Electro(chemical) nickel plating 2-5um, annealed at 850 degrees.
[0020] After the implementation of the above process, the qualified rate of nickel plating can reach more than 98%, and the surface will not be blistered or peeled.
Embodiment 3
[0021] Embodiment 3, nickel-plated aluminum-silicon substrate
[0022] 1. Surface cleaning, degreasing and decontamination;
[0023] 2. Spray 0.5-2um aluminum on the surface of the aluminum-silicon substrate, anneal at 400-500 degrees, the aluminum layer on the surface will fuse with the metal aluminum in the aluminum-silicon substrate to form a complete metal surface;
[0024] 3. Electro(chemical) nickel plating 2-5um, annealed at 850 degrees.
[0025] After the implementation of the above process, the qualified rate of nickel plating can reach more than 98%, and the surface will not be blistered or peeled.
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