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Super wide band cut-off long-wave-pass filter optical film and production method thereof

A manufacturing method and technology of filter film, applied in the direction of optical filter, optics, optical components, etc., can solve the problems of high passband transmittance, long plating cycle, not steep transition zone, etc., to improve adhesion and the quality of film-forming products, eliminate the cumulative error of film thickness, and ensure the effect of optical performance

Active Publication Date: 2013-07-17
NO 717 INST CHINA MARINE HEAVY IND GRP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Among them, the former is low in cost and has a wide absorption cutoff, but its optical performance is not good, the transition zone is not steep, and its stability is poor; the disadvantage of the latter is that the cutoff bandwidth is limited (generally no more than 0.25um), and the film structure is more complicated, but it can pass through the film. The system design and manufacturing process ensure that the filter film has good optical performance
Therefore, in order to realize the above-mentioned ultra-wide band long-wave pass filter film for astronomical navigation, there are three main difficulties: First, the cut-off band is ultra-wide and the pass-band transmittance is high. Generally, the color glass can only be cut to a depth of about 800nm. , while purely using dielectric filter film, the film structure is extremely complex (at least 65 layers or more), the plating cycle is long and the process is difficult, especially the film thickness monitoring accuracy is high; the second is the high slope of the transition zone (no more than 7%), considering actual manufacturing factors and yield issues, this value must be controlled within 5%, that is, the transition band does not exceed 70nm, which requires the total number of film layers to be at least 35 layers and the center wavelength of the filter film to be accurately positioned; The third is to require a dense film layer, small internal defects, and good mechanical and chemical stability against harsh environments.

Method used

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  • Super wide band cut-off long-wave-pass filter optical film and production method thereof
  • Super wide band cut-off long-wave-pass filter optical film and production method thereof
  • Super wide band cut-off long-wave-pass filter optical film and production method thereof

Examples

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Effect test

Embodiment 1

[0036] Example 1 :Such as figure 1 Shown is a basic embodiment of an ultra-broadband cut-off long-pass filter film of the present invention. An ultra-broadband cut-off longwave pass filter film, which includes a substrate 1, the substrate 1 is an optical element, its front and back sides are respectively coated with transition bonding layers 2, and the transition bonding layers 2 are alternately coated There are several layers of long-wave pass filter films with different central wavelengths, forming two long-wave pass filter films: one is the long-wave pass filter film n on the front of the substrate, and the other is the long-wave pass filter n' on the back of the substrate. , the two long-wave pass filter film systems are composed of a high refractive index layer and a low refractive index layer, figure 1 Middle: The long-wave pass filter film system n on the front of the substrate is composed of a high-refractive index layer 3 and a low-refractive-index layer 4, and the...

Embodiment 2

[0037] Example 2 : Different from the above-mentioned embodiment 1: the material of the substrate 1 is mainly selected from colored glass or infrared crystal; the material of the transition bonding layer is SiO 2 , or SiO, or Al 2 o 3 , the high refractive index material is TiO 2 , or Ta 2 o 5 , the low refractive index material is SiO 2 . The cut-off bands of the two long-wave pass filter films n and n' are completely connected in series, and there is a cut-off overlapping area of ​​10-50nm; wherein, the short-wave cut-off point of the long-wave pass filter film with a smaller central wavelength is smaller than the optical cut-off point. The upper limit of the intrinsic absorption cutoff of the component. The optical element after the long-wave pass filter film is finally formed has the optical characteristics of cut-off from the depth of the 400-1400nm band and the transmittance of the 1500-1700nm band not less than 92%.

Embodiment 3

[0038] Example 3 :Such as figure 2 Shown is a basic embodiment of the method for manufacturing an ultra-broadband cut-off long-pass filter film of the present invention. The manufacturing method of the ultra-broadband cut-off long-wave pass filter film of the present invention, its manufacturing steps include: A, substrate cleaning, B, substrate surface plasma etching treatment, C, transition bonding layer plating, D , high-refractive-index layer plating, E, low-refractive-index layer plating, F, the treatment after the coating is completed; The film thickness real-time monitoring method is to plate long-wave pass filter films with different center wavelengths on the front and back of the substrate respectively to form two long-wave pass filter film systems, one is the long-wave pass filter film system n on the front of the substrate, and the other is The long-wave pass filter film system n' on the reverse side of the substrate; the monitoring chip replacement strategy ref...

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Abstract

The invention relates to a super wide band cut-off long-wave-pass filter optical film and a production method thereof. A filter optical film comprises a substrate; transition bounding layers are respectively plated on a front surface and a rear surface of the substrate; a plurality of layers of long-wave-pass filter optical films with different central wavelengths are plated on the transition bounding layers in an alternating mode to form into two long-wave-pass filter optical film series which comprise a substrate front surface long-wave-pass filter optical film series and a substrate rear surface long-wave-pass filter optical film series; and the two long-wave-pass filter optical film series are formed by high refractive index layers and low refractive index layers. The production method of the super wide band cut-off long-wave-pass filter optical film comprises steps of substrate cleaning, substrate surface processing, transition bounding layer plating and high refractive index layer and low refractive index layer plating. The super wide band cut-off long-wave-pass filter optical film has the advantages of being high in transmittance, good in optical performance and good in adhesive force between film layers and the substrate. The production method of the super wide band cut-off long-wave-pass filter optical film has the advantages of being easy to refer and transplant, capable of adapting to mass coating film production of large size optical elements, capable of improving performance indexes of a detector and capable of being widely applied to the optical electric technical fields of an precision optical instrument, photoelectric detection and celestial navigation.

Description

technical field [0001] The invention relates to an ultra-wide band cut-off long-wave pass filter film and a manufacturing method thereof. It is used in the field of optoelectronic technology such as precision optical instruments, photoelectric detection, and astronomical navigation, and belongs to the field of optical thin film technology. Background technique [0002] Interference cut-off filters have irreplaceable advantages in improving the signal-to-noise ratio of photoelectric systems and eliminating stray light interference in non-working bands, so they are widely used in technical fields such as optical communications, photoelectric detection and imaging, and astronomical navigation. Among them, the working principle of the star-sensitive detector in celestial navigation is to use the characteristic that the luminous spectral intensity of stars is stronger than the stray light of the sky background in a limited band of near-infrared to identify and locate stars, which...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/20G02B5/28
Inventor 姚细林熊长新何光宗杨放
Owner NO 717 INST CHINA MARINE HEAVY IND GRP
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