Active driving wire cable table of silicon wafer stage of lithography machine

Abstract

The invention provides an active driving wire cable table of a silicon wafer stage of a lithography machine. The active driving wire cable table comprises a Y-direction sliding table, a Y-direction guide rail and a cross-telescopic linkage mechanism, wherein the Y-direction sliding table is disposed on the Y-direction guide rail through an air bearing; the Y-direction sliding table is driven by a sliding table motor and moves synchronously in the Y direction and on the silicon wafer stage; wire cable instrument is conveyed to the silicon wafer stage along the cross-telescopic linkage mechanism through the Y-direction sliding table; the cross-telescopic linkage mechanism comprises a cross telescopic connecting rod and a driver; one end of the cross telescopic connecting rod is connected with the Y-direction sliding table; the other end of the cross telescopic connecting rod is connected with the silicon wafer stage through the wire cable instrument; and the driver is used for driving the cross telescopic connecting rod to move along with an X direction, so that the wire cable is driven to move along the X direction. The active driving wire cable table of the silicon wafer stage of the lithography machine can realize active control of the wire cable table and follow motion of the wire cable table to the silicon wafer stage in an X-Y plane.

Description

technical field [0001] The invention relates to the field of semiconductor photolithography equipment, and in particular to an active driving cable stage of a silicon wafer stage of a photolithography machine. Background technique [0002] In semiconductor lithography equipment, the motion system of precision workpiece stages such as silicon wafer stage and mask stage is an extremely important key component. Its positioning accuracy directly affects the performance of lithography equipment, and its operating speed directly affects the production efficiency of lithography equipment. With the continuous improvement of the integration of VLSI devices and the continuous enhancement of lithography resolution, the requirements for the characteristic line width index of lithography machines are also continuously improved, and the corresponding requirements for the operating speed, acceleration and accuracy of the workpiece table are also constantly increasing. improve. [0003] Th...

AI Technical Summary

Problems solved by technology

The pipeline facilities of this scheme are supported in the vertical direction to avoid friction between the sag and the work surface, but passively follow the movement of the wafer stage in the Y direction, which will affect the positioning accuracy of the movement of the wafer stage

[0005] Another prior art discloses a cable table for a silicon wafer stage of a lithography machine using a multi-joint manipulator. The cable table includes a control device and at least one multi-joint manipulator. On the silicon wafer stage, by controlling the ro

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