Preparation method of photonic crystal with inverse opal structure

An anti-opal structure and photonic crystal technology, applied in crystal growth, chemical instruments and methods, single crystal growth, etc., can solve the problems that colloids are difficult to fill gaps, opal structures are easy to fall off and destroy, and consume a lot of manpower, material resources and financial resources. , to achieve the effect of low cost, simple method and convenient operation

Active Publication Date: 2013-10-16
ADVANCED TECHNOLOGY & MATERIALS CO LTD
View PDF8 Cites 9 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method has the following disadvantages: First, due to the small voids of opal, it is difficult for the colloid to be filled to completely fill the voids, resulting in some defects; second, during the immersion process, the opal structure is easy to fall off and be damaged.
Al

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation method of photonic crystal with inverse opal structure
  • Preparation method of photonic crystal with inverse opal structure
  • Preparation method of photonic crystal with inverse opal structure

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0033] Examples:

[0034] Take 0.1 ml 10% polystyrene microsphere suspension emulsion (weight percentage, particle size: 330nm) and 0.05 ml 10% TEOS aqueous solution (weight percentage, SiO 2 Calculate) Put it into a 4ml cuvette, and add 3ml of mill-Q water to the cuvette, ultrasonically disperse for 10 minutes, and mix the above solution evenly. Then put a clean glass substrate vertically into the cuvette. Put the cuvette on the heating table, at 75℃, the polystyrene microsphere template and SiO 2 The colloidal matrix was assembled and grown on a glass substrate, kept for 48 hours, and then taken out to obtain polystyrene microspheres and SiO 2 Compound structure of colloid. Put the above composite structure on a high-temperature heating table, heat it in air at 375 ℃ for 10 hours, and then take it out, thereby obtaining high-quality, defect-free SiO 2 Inverse opal structure.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a preparation method of a photonic crystal with an inverse opal structure, and belongs to the technical field of the photonic crystal with the inverse opal structure. The preparation method comprises the following technological steps of: firstly adding polymeric microspheres to colloidal sol in proportions, and then dispersing the mixture for 10-60 minutes by using ultrasonic waves so as to form a uniform stable suspension emulsion; transferring the prepared suspended emulsion to a glass container, and vertically placing a clean substrate in the glass container filled with the suspended emulsion; then slantwise placing the glass container on a heating platform, and heating so as to volatilize a solvent; utilizing a binary synergistic effect for ensuring that polymeric microspheres and the colloidal sol grow on the substrate in a self-organizing manner to form a polymer; after ending growth, taking out a sample, and heating in air under an appropriate temperature condition so as to decompose and volatize the polymer; cooling and taking the sample to obtain the photonic crystal with the inverse opal structure, which has good degree of crystallinity and no defects and is large in area.

Description

technical field [0001] The invention belongs to the technical field of photonic crystals with inverse opal structures, and in particular provides a method for preparing photonic crystals with inverse opal structures, which can prepare large-area, defect-free photonic crystals with inverse opal structures. Background technique [0002] Photonic crystals are structures in which dielectric materials with different dielectric constants are arranged periodically in space. Similar to the behavior of electrons in semiconductor crystals, when photons propagate in photonic crystals, electromagnetic waves of the same magnitude as the periodic arrangement of the medium are relatively strongly scattered by the periodically arranged inhomogeneous medium, making electrons in this wavelength range Waves are prohibited from propagating in the photonic crystal to create a photonic band gap. In addition, photonic crystals also have the characteristics of suppressing spontaneous emission and ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C30B29/58
Inventor 闫东伟武英周少雄
Owner ADVANCED TECHNOLOGY & MATERIALS CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products