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A method for preparing anti-reflection film from silica hydrosol

A silica and hydrosol technology, applied in the field of anti-reflection films, can solve problems such as poor friction resistance and mechanical strength, and achieve a simple and easy preparation process, cheap and easily available raw materials, and excellent anti-reflection and friction resistance properties. Effect

Inactive Publication Date: 2016-08-10
CHANGZHOU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Silica hydrosol has been commercialized for many years, the raw material is cheap and easy to obtain, and its product appearance is similar to the silica particles obtained by alkali-catalyzed TEOS, directly using silica hydrosol or hydrosol and organic solvents (isopropanol, ethanol Etc.) The anti-reflection coating on the glass surface will produce the same effect as the alkali coating, that is, it has high transmittance in the visible light band, but the friction resistance and mechanical strength are poor. If the silicon oxide hydrosol can be improved. The bonding force of the glass substrate undoubtedly has a strong competitiveness in the industrial application of anti-reflection film

Method used

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  • A method for preparing anti-reflection film from silica hydrosol

Examples

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Embodiment 1

[0013] Example 1: In a clean and dry 100mL beaker, mix 29mL of absolute ethanol, 0.5mL of hydrogen peroxide, 0.8g of phosphoric acid, and 5g of silica hydrosol (30%), wherein absolute alcohol: silicon dioxide: hydrogen peroxide: phosphoric acid The molar ratio is 20:1.0:0.2:1.7. Add 0.7g of cetyltrimethylammonium bromide to the above solution to make the concentration of cetyltrimethylammonium bromide in the solution about 20g / L, stir magnetically for 5h at room temperature, and then age After 24 hours, a silica sol impregnation solution was obtained. Put the 20mm×100mm glass substrate (light transmittance 90%) into 37% hydrochloric acid: 30% hydrogen peroxide: deionized water = 1:1:5 (volume ratio) solution and 37% ammonia water: 30% Hydrogen peroxide: deionized water = 1:1:5 (volume ratio) Soak in the solution for 2 hours, then fully wash with absolute ethanol and deionized water by ultrasonic waves, and dry for later use. Using the impregnation pulling method on the self-...

Embodiment 2

[0014] Example 2: In a clean and dry 100mL beaker, mix 58mL of absolute ethanol, 2mL of hydrogen peroxide, 2g of phosphoric acid, and 5g of silica hydrosol (30%), wherein the moles of absolute ethanol: silicon dioxide: hydrogen peroxide: phosphoric acid The ratio is 40:1.0:0.8:4.5. Add 1.7g of cetyltrimethylammonium bromide to the above solution to make the concentration of cetyltrimethylammonium bromide in the solution about 25g / L, stir magnetically for 5h at room temperature, and then age After 24 hours, a silica sol impregnation solution was obtained. Put the 20mm×100mm glass substrate (light transmittance 90%) into 37% hydrochloric acid: 30% hydrogen peroxide: deionized water = 1:1:5 (volume ratio) solution and 37% ammonia water: 30% Hydrogen peroxide: deionized water = 1:1:5 (volume ratio) Soak in the solution for 2 hours, then fully wash with absolute ethanol and deionized water by ultrasonic waves, and dry for later use. Using the impregnation pulling method on a self...

Embodiment 3

[0015] Example 3: In a clean and dry 100mL beaker, mix 44mL of absolute ethanol, 0.5mL of hydrogen peroxide, 0.8g of phosphoric acid, and 5g of silica hydrosol (30%), wherein absolute alcohol: silicon dioxide: hydrogen peroxide: phosphoric acid The molar ratio is 30:1.0:0.2:1.7. Add 1g of cetyltrimethylammonium bromide to the above solution to make the concentration of cetyltrimethylammonium bromide in the solution about 20g / L, stir magnetically at room temperature for 5h, and then age for 24h Finally, a silica sol impregnation solution is obtained. Put the 20mm×100mm glass substrate (light transmittance 90%) into 37% hydrochloric acid: 30% hydrogen peroxide: deionized water = 1:1:5 (volume ratio) solution and 37% ammonia water: 30% Hydrogen peroxide: deionized water = 1:1:5 (volume ratio) Soak in the solution for 2 hours, then fully wash with absolute ethanol and deionized water by ultrasonic waves, and dry for later use. Using the impregnation pulling method on the self-ma...

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Abstract

The invention discloses a method for preparing anti-reflecting film from silicon dioxide hydrosol, and relates to the technical field of anti-reflecting films. The method comprises the following steps: taking commercial silicon dioxide hydrosol as a silicon source, mixing the commercial silicon dioxide hydrosol with phosphoric acid, hydrogen peroxide, cetyl trimethyl ammonium bromide and ethyl alcohol according to a certain proportion to prepare monox sol steeping liquor, utilizing a pulling method to plate a layer of thin film on a clean glass surface, solidifying for 30 minutes at the temperature of 80 DEG C, then heat treating at the temperature of 500 DEG C for 1 hour, and obtaining the anti-reflecting film of which the average light transmittance in a visible light range is above 98% and the rigidity is 6 H. Compared with the prior art, the preparation technology is simple and practicable, the raw material is cheap and easy to get, and the prepared thin film has the advantages of excellent anti-reflecting and wear-resisting properties.

Description

technical field [0001] The invention relates to the technical field of anti-reflection films, in particular to a method for preparing an anti-reflection film with excellent anti-reflection and wear resistance properties from silica hydrosol. Background technique [0002] As a surface optical treatment technology, anti-reflection film has been widely used in display screens, optical lenses, high-energy laser windows, automotive and building glass and other fields. In recent years, with the vigorous development of photovoltaic power generation and solar thermal power technology, anti-reflection coating technology has received unprecedented attention. In solar photoelectric and photothermal conversion equipment, the main function of the anti-reflection film is to reduce or eliminate the reflected light on the surface of the glass cover plate, increase the transmittance of these components for sunlight, reduce or eliminate the stray light of the system, and thus improve the perf...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C17/23
Inventor 陈若愚王燕王红宁刘小华
Owner CHANGZHOU UNIV