Polycrystalline silicon and preparation method thereof
A technology of polysilicon and silicon materials, applied in the field of solar cells, can solve the problems of not adopting large-scale production, high input cost, and low material yield, and achieve the effects of less dislocation defects, high material yield, and simple operation
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[0026] Prepare a quartz crucible whose bottom inner surface is rough and sprayed with quartz sand, and prepare an ingot furnace. The model of the ingot furnace is R13800-1 / UM.
[0027] The preparation method of the polysilicon includes the following steps:
[0028] (1) Put 810 kg of silicon material doped with electroactive dopants into a quartz crucible, the target resistivity of the silicon material doped with electroactive dopants is 1.7Ω·cm, and put the quartz crucible into the ingot furnace Vacuum and heat in the insulated cage;
[0029] (2) Control the temperature of the ingot furnace heater to 1560°C, then keep the heater temperature at 1560°C to completely melt the silicon material. When the silicon material is completely melted, control the temperature of the bottom of the quartz crucible to 1420°C;
[0030] (3) Reduce the temperature of the ingot furnace heater from 1560°C to 1425°C with a temperature drop rate of 150-200°C / h, and then keep it for 30-90 minutes;
[0031] (4) ...
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