Solar monocrystalline silicon wafer cleaning solution and cleaning method

A single crystal silicon wafer, solar energy technology, applied in cleaning methods and utensils, cleaning methods using liquids, chemical instruments and methods, etc. It can reduce the residues of organics and metal ions, improve market competitiveness, and improve the surface state structure.

Active Publication Date: 2016-08-17
GCL POLY ENERGY HLDG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The surface of the monocrystalline silicon wafer cleaned by this process has many metal impurities and organic dirt residues, and white spots appear during flocking, which reduces the conversion efficiency of the cell, and even fails to meet the technical requirements of the cell, affecting the finished product. rate and product quality

Method used

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  • Solar monocrystalline silicon wafer cleaning solution and cleaning method
  • Solar monocrystalline silicon wafer cleaning solution and cleaning method
  • Solar monocrystalline silicon wafer cleaning solution and cleaning method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0049] 1) A batch of 200 monocrystalline silicon wafers is ultrasonically cleaned in the pickling tank, pure water rinsing tank, cleaning agent washing tank, cleaning agent washing tank and pure water rinsing tank. The cleaning time in each tank is 240s.

[0050] 2) Immerse the batch of monocrystalline silicon wafers in the chemical tank containing solar single crystal silicon wafer cleaning solution for cleaning, turn on the ultrasound, set the temperature of the chemical tank to 35°C, and the cleaning time is 240s.

[0051] Each component and mass percentage in this solar single crystal silicon wafer cleaning liquid are respectively: hydrogen peroxide adopts mass fraction to be 30% hydrogen peroxide analytical pure reagent, and mass percentage is 3%; Potassium hydroxide adopts analytical pure reagent, mass percentage is 0.1%; the balance is pure water, and the resistance is 15 megohms.

[0052] 3) The batch of monocrystalline silicon wafers cleaned in step 2) are rinsed twi...

Embodiment 2

[0054] 1) A batch of 225 monocrystalline silicon wafers is ultrasonically cleaned in the pickling tank, pure water rinsing tank, cleaning agent washing tank, cleaning agent washing tank and pure water rinsing tank. The cleaning time in each tank is 300s.

[0055] 2) Immerse the batch of monocrystalline silicon wafers in the chemical tank containing solar single crystal silicon wafer cleaning solution for cleaning, turn on the ultrasound, set the temperature of the chemical tank to 45°C, and the cleaning time is 300s.

[0056] Each component and mass percent in this solar single crystal silicon wafer cleaning solution are respectively: hydrogen peroxide adopts the mass fraction of 30% hydrogen peroxide analytical pure reagent, and the mass percentage is 2%; Potassium hydroxide adopts analytical pure reagent, the mass percentage is 0.2%; the balance is pure water, and the resistance is 13 megohms.

[0057] 3) The batch of monocrystalline silicon wafers cleaned in step 2) are ri...

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Abstract

The invention relates to a cleaning solution for solar monocrystalline silicon wafers, which comprises 1% to 5% by mass of 30% hydrogen peroxide solution, 0.05% to 0.30% by mass of potassium hydroxide and 94.95% to 98.95% by mass of pure water. The solar single crystal silicon wafer cleaning solution utilizes the strong oxidizing properties of hydrogen peroxide and OH ‑ The corrosion of the oxide film can effectively remove the organic matter, oxide film and pollutants deposited in the oxide film on the surface of the silicon wafer, improve the cleanliness of the silicon wafer surface, and prevent white spots and chromatic aberrations during flocking. In addition, the present invention also relates to a cleaning method for solar monocrystalline silicon chips.

Description

technical field [0001] The invention relates to the field of photovoltaic products, in particular to a solar monocrystalline silicon chip cleaning solution and a cleaning method. Background technique [0002] With the rapid development and wide application of global crystalline silicon solar cells, high-quality photovoltaic devices with excellent performance and good stability are increasingly favored by the market. Among them, the cleanliness and surface state of the silicon wafer surface are crucial to high-quality photovoltaic devices. Silicon wafers are processed by wire cutting, the abrasion of steel wires, the grinding of silicon carbide and the residue of cutting fluid will inevitably cause the surface of silicon wafers to be dirty. The purpose of silicon wafer cleaning is to remove dirt such as particles, metals and organic substances on the surface of the wafer. If the cleaning effect of the silicon wafer cannot meet the requirements, no matter how good the proces...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B08B3/08C11D7/18
Inventor 薛晓敏孙翠枝
Owner GCL POLY ENERGY HLDG
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