Dual-motor optical element axial adjustment device

Abstract

The invention provides a dual-motor optical element axial adjustment device, relates to the technical field of deep ultraviolet projection photoetching objective lens structural design and adjustment, and aims to solve the problems that an existing optical element aligning device is provided with a large number of actuators and is complex in mechanism and high in processing difficulty. The dual-motor optical element axial adjustment device comprises four capacitive sensors, an optical frame, eight connection screws, a smooth driving block and two piezoelectric actuators. The four capacitive sensors are placed parallel to the upper surface of the optical frame, are evenly distributed along the upper edge of the optical frame, and correspond to the midpoints of all right-angle sides of the smooth driving block. The optical frame and the smooth driving block are fixed through the connection screws. The two piezoelectric actuators are arranged at the diagonal positions of the smooth driving block respectively. An optical element is arranged in the optical frame. By means of the dual-motor optical element axial adjustment device, rapid and precise adjustment is realized, and meanwhile, the problems of friction, lubrication and hysteresis of a mechanical hinge are avoided; the smooth driving block acts on the optical frame so that damage to the surface form of the optical element by adjustment force can be effectively lowered; the structure is simple, a small number of motors are needed, and processing cost is low.

Description

technical field [0001] The invention relates to the technical field of structure design and adjustment of deep ultraviolet projection lithography objective lens, in particular to a dual-motor optical element axial adjustment device that can be used in lithography projection objective lens system. Background technique [0002] Projection lithography equipment, as one of the key equipments in the manufacture of large-scale integrated circuits, has become a research hotspot in recent years. With the improvement of the fineness of integrated circuits, the resolution requirements of projection optical equipment are gradually increasing. At present, ArF excimer laser projection lithography equipment with a wavelength of 193.368nm has become the mainstream equipment for 90nm, 65nm and 45nm node integrated circuit manufacturing. During the assembly process of the projection lithography objective lens, various aberrations of the optical system need to be compensated in order to obtai...

AI Technical Summary

Problems solved by technology

[0004] In order to solve the problem that there are many drivers in the existing optical element centering device, the mechanism is complicated, and t

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