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Antiseptic mixture and photoresist stripper composition

A technology of preservatives and mixtures, applied in the field of lithographic printing of printed circuit boards, can solve problems affecting product quality, corrosion of wiring materials, etc., and achieve excellent peeling effect

Inactive Publication Date: 2014-01-15
刘超
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Furthermore, photoresist residues are similar in composition to wiring materials, so when using these photoresist residue removal solutions for substrate processing, there is a problem of corroding wiring materials, thereby affecting product quality

Method used

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  • Antiseptic mixture and photoresist stripper composition
  • Antiseptic mixture and photoresist stripper composition

Examples

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Effect test

preparation example Construction

[0041] The preparation method of described cinnamyl imidazoline is specifically:

[0042] Put 10ml of analytically pure diethylenetriamine in a four-necked flask, raise the temperature to 150°C, add 3ml of analytically pure toluene dropwise, add 22g of analytically pure cinnamic acid, stir under nitrogen, and then heat up to 170°C to start acyl After reaction for 5 hours, the temperature was raised to 240°C to start cyclodehydration for 3 hours. After the reaction was completed, it was placed in a vacuum drying oven to dry to obtain cinnamyl imidazoline in a brown viscous shape. The reaction formula is as follows:

[0043]

[0044] The present invention also provides a preparation method of the above-mentioned photoresist stripper composition. The above-mentioned polyol mixture, the above-mentioned Mix the anticorrosion agent mixture, the above-mentioned organic amine and the above-mentioned deionized water, and stir evenly to obtain the product.

Embodiment 1

[0046] The preparation of embodiment 1 cinnamyl imidazoline

[0047] Put 10ml of analytically pure diethylenetriamine in a four-necked flask, raise the temperature to 150°C, add 3ml of analytically pure toluene dropwise, add 22g of analytically pure cinnamic acid, stir under nitrogen, and then heat up to 170°C to start acyl After 5 hours of reaction, the temperature was raised to 240° C. to start cyclodehydration for 3 hours. After the reaction was completed, it was placed in a vacuum oven to dry to obtain cinnamyl imidazoline in a brown viscous shape.

Embodiment 2

[0048] Embodiment 2 photoresist stripping agent 1

[0049] With 5g sorbitol, 10g xylitol, 5g tetramethylammonium hydroxide, 20g sodium methylate, 5g morpholine, 4g polyoxyethylene ether, 15gN-methyl-2-pyrrolidone, 4g cinnamyl imidazole prepared in Example 1 Phenylline, 6g of 2-methyl-5-dodecylisoxazole, 20g of monoethanolamine and 6g of ionized water were mixed and stirred evenly to obtain photoresist stripper 1.

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Abstract

The invention provides an antiseptic mixture which comprises cinnamylimidazoline and 2-methyl-5-dodecylisoxazole. A photoresist stripper composition comprising the antiseptic mixture, provided by the invention, is excellent in stripping a photoresist layer, does not result in corrosion to metal wiring materials, and shows a great advantage in the manufacturing process of semiconductor circuit elements.

Description

technical field [0001] The invention relates to the technical field of printed circuit board lithography, in particular to a photoresist stripper composition for stripping photoresist after the development process, and further relates to a photoresist stripper used for patterning metal wiring When it is used, it can reduce the corrosion of metal wiring, and can achieve a photoresist stripping agent composition with excellent stripping effect. Background technique [0002] Photoresist is an essential substance in the photolithography process, and the photolithography process is generally used in semiconductor devices such as integrated circuits, large-scale integrated circuits, and ultra-large-scale integrated circuits, as well as image display devices such as liquid crystal displays and flat panel displays. manufacture. [0003] The photoresist removal techniques on the substrate are: wet stripping, which uses chemicals called photoresist strippers to dissolve or partially ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/42
Inventor 刘超
Owner 刘超
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