A kind of titanium niobate or niobate epitaxial thin film and its preparation method and application
A technology of niobium ferrite and epitaxial thin film, which is applied in the field of dielectric materials, can solve problems such as application constraints of components, and achieve the effects of small fluctuations in dielectric properties, simple manufacturing process, and good thermal performance stability
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Embodiment 1
[0035] Using the method of radio frequency magnetron sputtering, through the magnetron sputtering apparatus, polycrystalline Ca (Fe, Nb) 0.05 Ti 0.9 o 3 As the target, the sputtering oxygen pressure is 2.1mbar, and the sputtering temperature is 750°C, on Nd-doped SrTiO 3 (100) Epitaxial growth of Ca(Fe,Nb) on single crystal substrate 0.05 Ti 0.9 o 3 The film is naturally cooled to room temperature under 2mbar oxygen pressure after sputtering to obtain a titanium niobate ferrite or niobate epitaxial film.
[0036] Wherein, the preparation method of the target comprises the following steps:
[0037] 1) CaCO 3 、TiO 2 Mix at a molar ratio of 1:1, use absolute ethanol as a solvent, and undergo wet ball milling for 4 hours to obtain sample A;
[0038] CaCO 3 , Nb 2 o 5 , Fe 3 o 4 Mixed at a molar ratio of 50:12.5:8.3, using absolute ethanol as a solvent, and subjected to wet ball milling for 4 hours, to obtain sample B; wherein, CaCO 3 、TiO 2 , Nb 2 o 5 and Fe 3 o ...
Embodiment 2
[0043] Utilize the method of radio frequency magnetron sputtering, through the magnetron sputtering apparatus, with Ca(Fe,Nb) 0.15 Ti 0.7 o 3 Polycrystalline as the target material, the sputtering oxygen pressure is 1.8mbar, and the sputtering temperature is 600°C, on Nd-doped SrTiO 3 (100) Epitaxial growth of Ca(Fe,Nb) on single crystal substrate 0.15 Ti 0.7 o 3 After sputtering, the thin film is naturally cooled to room temperature under 2mbar oxygen pressure to obtain titanium calcium niobate ferrite epitaxial thin film.
[0044] Wherein, the preparation method of the target comprises the following steps:
[0045] 1) CaCO 3 、TiO 2 Mix at a molar ratio of 1:1, use absolute ethanol as a solvent, and undergo wet ball milling for 5 hours to obtain sample A;
[0046] CaCO 3 , Nb 2 o 5 , Fe 3 o 4 Mixed at a molar ratio of 50:12.5:8.3, using absolute ethanol as a solvent, and subjected to wet ball milling for 4 hours, to obtain sample B; wherein, CaCO 3 、TiO 2 , Nb ...
Embodiment 3
[0051] Utilize the method of radio frequency magnetron sputtering, through the magnetron sputtering apparatus, with Ca(Fe,Nb) 0.25 Ti 0.5 o 3 Polycrystalline as the target material, the sputtering oxygen pressure is 5mbar, and the sputtering temperature is 745°C, on Nd-doped SrTiO 3 (100) Epitaxial growth of Ca(Fe,Nb) on single crystal substrate 0.25 Ti 0.5 o 3 After sputtering, the thin film is naturally cooled to room temperature under 2mbar oxygen pressure to obtain titanium calcium niobate ferrite epitaxial thin film.
[0052] Wherein, the preparation method of the target comprises the following steps:
[0053] 1) CaCO 3 、TiO 2 Mix at a molar ratio of 1:1, use absolute ethanol as a solvent, and undergo wet ball milling for 6 hours to obtain sample A;
[0054] CaCO 3 , Nb 2 o 5 , Fe 3 o 4 Mixed at a molar ratio of 50:12.5:8.3, using absolute ethanol as a solvent, and subjected to wet ball milling for 5 hours to obtain sample B; wherein, CaCO 3 、TiO 2 , Nb 2 ...
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