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Semiconductor device and manufacturing method thereof

A manufacturing method and semiconductor technology, applied in the fields of semiconductor/solid-state device manufacturing, semiconductor devices, semiconductor/solid-state device components, etc., can solve problems such as performance stability and reliability effects, fluctuations in semiconductor devices, and avoid circuit design difficulties. Large, low-cost manufacturing method, the effect of reduced difficulty

Inactive Publication Date: 2016-05-11
SHANGHAI BEILING
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, this method of using bonding wires also introduces the equivalent inductance of bonding wires, and its process fluctuations will have a great impact on the stability and reliability of semiconductor device performance.

Method used

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  • Semiconductor device and manufacturing method thereof
  • Semiconductor device and manufacturing method thereof
  • Semiconductor device and manufacturing method thereof

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Experimental program
Comparison scheme
Effect test

no. 1 approach

[0044] The semiconductor device provided by the present invention includes a substrate 1, an insulating layer 2 formed on the substrate 1, and at least a first metal interconnect layer 3 and a second metal interconnect layer 4 sequentially formed on the insulating layer 2. There is an insulating substance between each metal interconnection layer. The semiconductor device has an active area and a non-active area, and at least one plate capacitor is formed in the non-active area.

[0045] refer to figure 1 , is a schematic cross-sectional view of a partial region of the first embodiment of the semiconductor device of the present invention. The flat panel capacitor includes a first metal layer 10 and a second metal layer 20 parallel to each other. The first metal layer 10 is kept in the passive area by adjusting the etching layout in the etching process of forming the first metal interconnection layer 3. Part of the metal in the region, the second metal layer 20 is a part of th...

no. 2 approach

[0050] refer to image 3 (a) is a schematic cross-sectional view of a partial region of the second embodiment of the semiconductor device of the present invention. The first pin 101 is connected to the ground pin in the package pin of the semiconductor device, and the second pin 202 is connected to the input pin or the output pin in the package pin of the semiconductor device.

[0051] The equivalent circuit diagram of this connection is shown in image 3 As shown in (b), it is equivalent to connecting a capacitor in parallel at the input or output end of the semiconductor device, so as to realize the matching of the input or output impedance of the active region of the semiconductor device to the target input or output impedance.

no. 3 approach

[0053] refer to Figure 4 (a), is a schematic cross-sectional view of a first example of a partial region of the third embodiment of the semiconductor device of the present invention. The first pin 101 is connected to an input pin or an output pin in the package pins of the semiconductor device, and the second pin 202 is kept floating or connected to a predetermined pin in the package pins of the semiconductor device.

[0054] When the second pin 202 keeps the potential floating, the equivalent circuit schematic diagram of this connection mode is shown as Figure 4 As shown in (b), it is equivalent to connecting a capacitor in series with the input or output terminal of the semiconductor device, so as to realize the matching of the input or output impedance of the active region of the semiconductor device to the target input or output impedance.

[0055] The second pin 202 may also be connected to a predetermined pin of the package pins of the semiconductor device, so that th...

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PUM

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Abstract

The invention provides a semiconductor device and a manufacturing method thereof. The semiconductor device comprises a substrate, an insulating layer and at least a first metal interconnection layer and a second metal interconnection layer, wherein the insulating layer is formed on the substrate; the at least first metal interconnection layer and the second metal interconnection layer are sequentially formed on the insulating layer; an insulating substance is spaced between the metal interconnection layers; the semiconductor device comprises an active region and a non-active region; at least one plate capacitor is formed in the non-active region; and the plate capacitor is connected to an input end or an output end of the semiconductor device, so that the input impedance or output impedance of the semiconductor device is matched with the target impedance. The invention further provides the manufacturing method of the semiconductor device, impedance matching of the input end or the output end of the semiconductor device can be realized conveniently, rapidly, efficiently and cheaply, and the complexity of the semiconductor device in a usage process and the possible fault rate are reduced; and at the same time, the semiconductor device has the advantages as follows: the circuit design is simple, the working reliability is high, and the performance of the device is stable and reliable.

Description

technical field [0001] The invention relates to the field of semiconductors, in particular to a semiconductor device and a manufacturing method thereof. Background technique [0002] The input and output impedances of many semiconductor devices currently manufactured are very low. When they are used in radio frequency power amplifier circuits or other specific circuits, a large number of discrete components need to be used in the peripheral circuits for impedance matching. This method will increase the difficulty of circuit design and reduce the reliability of circuit operation. [0003] An existing improvement measure is to use bonding wires to connect semiconductor devices and capacitors on the same packaging frame and package them together, which can avoid using peripheral circuits for impedance matching. However, this method of using bonding wires also introduces the equivalent inductance of the bonding wires, and its process fluctuations will have a great impact on the...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/02H01L23/482
CPCH01L2224/48091H01L2224/49107H01L2924/30111
Inventor 林敏之陈铭陈伟韩继国王举贵
Owner SHANGHAI BEILING