Laser diode with p type substrate

A laser diode, p-type technology, used in lasers, laser parts, semiconductor lasers, etc., can solve the problems of shortened laser diode life, reduced quality and performance of epitaxial layers on substrates, crystal strain, etc., to reduce defect density, The effect of improving the recombination probability and improving the luminous efficiency

Active Publication Date: 2014-02-19
LIYANG TECH DEV CENT
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, GaN as a substrate generally includes various defects, such as dislocations, gaps or vacancies, etc. The defects will cause crystal strain

Method used

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  • Laser diode with p type substrate

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Example Embodiment

[0015] See figure 1 , The laser diode of the present invention includes a p-GaN substrate 2, wherein a p-electrode 1 is provided under the p-GaN substrate 2; a p-type interface layer 3, a light-emitting layer 4, and an n-type interface layer 3, a light-emitting layer 4, and an n-type interface layer 3 are sequentially arranged on the p-GaN substrate 2. Interface layer 5, n-type injection layer 6, n electrode 7;

[0016] Among them, the p-type interface layer 3 is p-Al x In y Ga 1-x-y P, where 0

[0017] Among them, the light-emitting layer 4 is a multiple quantum well layer with a superlattice structure, and the material of the multiple quantum well layer is ZnO / Zn 1-a Mg a O / Zn 1-b As b O, where 01-a Mg a O / Zn 1-b As b O constitute. The structure of the light-emitting layer is specifically: the ZnO layer sequentially has Zn 1-a Mg a O layer and Zn 1-b As b The O layer, these three layers form a sandwich structure, a...

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Abstract

The invention discloses a laser diode with a p type substrate. The laser diode with the p type substrate comprises the p-GaN substrate, wherein a p electrode is arranged at the bottom of the p-GaN substrate, and a p type interface layer, a luminous layer, an n type interface layer, an n type injection layer and an n electrode are arranged on the p-GaN substrate in sequence.

Description

technical field [0001] The invention belongs to the technical field of semiconductors, in particular to a p-type substrate laser diode. Background technique [0002] Zinc oxide (ZnO) is a new type II-VI direct bandgap wide bandgap semiconductor material. Zinc oxide (ZnO) is similar to GaN in terms of lattice structure, unit cell parameters and bandgap width, and has a higher melting point and greater exciton binding energy than GaN, and has lower photoluminescence and stimulated emission threshold as well as good electromechanical coupling properties, thermal and chemical stability. At room temperature, the band gap of zinc oxide (ZnO) is 3.37eV, and the free exciton binding energy is as high as 60meV, which is much larger than that of GaN, so it is easier to achieve exciton gain at room temperature or higher. However, GaN as a substrate generally includes various defects, such as dislocations, gaps or vacancies, etc. The defects will cause crystal strain, and the strain w...

Claims

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Application Information

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IPC IPC(8): H01S5/34H01S5/347
Inventor 丛国芳
Owner LIYANG TECH DEV CENT
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