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Infrared high-emissivity coating material and preparation method thereof

A high emissivity, coating material technology, applied in coatings, alkali metal silicate coatings, etc., can solve the problems of coating emissivity attenuation, affecting service life, high cost, stable infrared emissivity, infrared emission High efficiency and long service life

Inactive Publication Date: 2014-03-05
HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
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Problems solved by technology

[0003] The products of the above-mentioned prior art are all based on metal oxide systems, combined with a small amount of additives, calcined at high temperature, crushed and used in conjunction with binders. The high-temperature emissivity can reach about 0.9. Although these existing coatings have certain energy-saving However, there are still some problems, such as the emissivity of the coating decays with time, which affects the service life; the bonding force between the coating and the substrate is insufficient, and it is easy to peel off and fall off after a period of use, which restricts the application of coatings on industrial kilns. At the same time, the cost and selling price are high, the price per kilogram is generally more than 100 yuan, and the cost of using a large number of industrial kilns is relatively high

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  • Infrared high-emissivity coating material and preparation method thereof

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preparation example Construction

[0040] Based on the above-mentioned infrared high emissivity coating material, the embodiment of the present invention also provides a preparation method of an infrared high emissivity coating material, such as figure 1 Shown is a schematic flow chart of the preparation method of the infrared high-emissivity coating material described in the embodiment of the present invention, and the preparation method includes:

[0041] Step 11: Weigh the raw materials for making infrared high-emissivity powder materials according to a certain weight percentage, add them to a ball mill and mix them evenly

[0042] In this step, the weight percent of the raw material of the infrared high emissivity powder material is: iron slag: 45-75%; iron oxide: 0-10%; manganese oxide: 5-15%; zirconia: 5% -15%; Chromium Oxide: 5-15%; Silicon Carbide: 5-15%.

[0043] Step 12: heat-treat the ball-milled powder material at a high temperature of 1200°C for more than 8 hours, ball-mill the heat-treated powder...

Embodiment 1

[0049] 1. Weigh 2kg of iron slag, 0.4kg of iron oxide, 0.4kg of manganese oxide, 0.4kg of zirconia, 0.4kg of chromium oxide, and 0.4kg of silicon carbide, add them to a ball mill, grind for several hours, and mix the powder evenly.

[0050] 2. The powder mixed by the ball mill is heat-treated at a high temperature of 1200° C. for 12 hours to obtain a powder material with high infrared emissivity.

[0051] 3. After the heat treatment is finished, cool down to room temperature, and ball mill the powder for several hours to obtain an ultrafine powder with a particle size below 1 micron.

[0052] 4. Take again 10kg of water, 2.5kg of water glass, 0.125kg of carboxymethyl cellulose, and 0.5kg of ultrafine silicon dioxide, put them into a blender, and stir until viscous colloidal material.

[0053] 5. Weigh the infrared high-emissivity powder material and colloidal material in a weight ratio of 1:3, stir and mix evenly, and then obtain the usable infrared high-emissivity coating mat...

Embodiment 2

[0055] 1. Weigh 1.8kg of silicon dioxide, 0.6kg of iron oxide, 0.4kg of manganese oxide, 0.4kg of zirconia, 0.4kg of chromium oxide, and 0.4kg of silicon carbide, add to a ball mill, grind and mix well.

[0056] 2. Heat-treat the mixed powder at a high temperature of 1200°C for 12 hours to obtain a powder material with high infrared emissivity.

[0057] 3. After the heat treatment is completed, the powder is ball milled to obtain an ultra-fine powder below 1 micron.

[0058] 4. Weigh 10 kg of water, 2 kg of aluminum dihydrogen phosphate, 0.125 kg of carboxymethyl cellulose, and 0.5 kg of ultrafine silicon dioxide, put them into a blender, and stir until viscous colloidal material.

[0059] 5. Weigh the infrared high-emissivity powder material and colloidal material in a weight ratio of 1:3, stir and mix evenly, and then obtain the usable infrared high-emissivity coating material.

[0060] The infrared high-emissivity coating material prepared according to the above process ha...

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Abstract

The embodiment of the invention discloses an infrared high-emissivity coating material which is prepared by mixing an infrared high-emissivity powder material and a colloid material, wherein the infrared high-emissivity powder material is prepared from iron-ore slag, iron oxide, manganese oxide, zirconium oxide, chromic oxide and silicon carbide through a treatment process of ball milling, mixing, high-temperature roasting and superfining; the colloid material is prepared by mixing water, sodium silicate, carboxymethyl cellulose and superfine silicon dioxide according to a certain weight ratio. The coating material has the advantages of high infrared emitting ability, stability, difficulty in aging, high binding ability of the coating with a substrate, long service life, low price and the like.

Description

technical field [0001] The invention relates to the technical field of high-temperature furnace coating materials, in particular to an infrared high-emissivity coating material and a preparation method. Background technique [0002] At present, the infrared high-emissivity coating material is an energy-saving material applied to industrial high-temperature furnaces. It can not only increase the emissivity of the inner wall of the furnace, improve the uniformity of heating, and improve the utilization rate of heat, but also enhance the surface strength of the inner wall of the furnace. Protect the inner wall of the furnace and prolong the service life of the furnace. A lot of research has been done on high-emissivity coatings at home and abroad, and many products have been developed. For example, zircon, SiO 2 、Al 2 o 3 Infrared high-emissivity coatings based mainly on the main component produced by Japan Rishang Co., Ltd. is SiO 2 、Al 2 o 3 , Fe 2 o 3 、Cr 2 o 3 In...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09D1/00C09D1/02C09D7/12C09D5/00
Inventor 邹键戴建明刘强春
Owner HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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