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Octafluoropropane purifying method

An octafluoropropane and purification method technology, applied in the disproportionation separation/purification of halogenated hydrocarbons, organic chemistry, etc., can solve the problems of low production efficiency, insufficient removal depth, and high equipment requirements, reducing the number of regenerations and avoiding energy consumption Large, high purity effect

Active Publication Date: 2014-03-26
FOSHAN HUATE GASES +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The technical problem to be solved by the embodiments of the present invention is to provide a method for purifying octafluoropropane, which not only removes most of the impurities containing chlorofluorocarbons in the raw material of octafluoropropane, but also solves the problem of insufficient removal depth of carbon dioxide and water in the prior art problems, reduce energy consumption, enhance the adsorption effect of the adsorbent, and make the octafluoropropane product reach a purity of more than 99.999%. At the same time, avoid high energy consumption due to pyrolysis of impurities, high equipment requirements, low production efficiency, and product purity not high

Method used

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Examples

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Effect test

Embodiment 1

[0093] Pass the octafluoropropane raw material into the normal temperature adsorber equipped with a molecular sieve mixed with 5A and 13X molecular sieve at 1:1.2 as the first adsorbent for normal temperature adsorption; pass the octafluoropropane raw material adsorbed at normal temperature into the first In the rectification tower, at 0°C, 0.4MPa, the vent flow is 2Nm 3 Carry out a rectification under the condition of one rectification; pass the octafluoropropane raw material through the first rectification into the second rectification tower, at -10°C, 0.3MPa, and the vent flow rate is 0.5Nm 3 Secondary rectification is carried out under the condition of / h; the rectified octafluoropropane raw material is placed at a temperature of -75°C, and the second adsorbent used includes CO 2 The special adsorbent is the second adsorbent a and 3A molecular sieve is used as the second adsorbent b for low-temperature adsorption; the octafluoropropane raw material that has been adsorbed a...

Embodiment 2

[0095] Pass the octafluoropropane raw material into the normal temperature adsorber equipped with a molecular sieve mixed with 5A and 13X molecular sieve at 1:1.5 as the first adsorbent for normal temperature adsorption; pass the octafluoropropane raw material adsorbed at normal temperature into the first In the rectification tower, at 10°C, 0.6MPa, the vent flow rate is 0.2Nm 3 Carry out a rectification under the condition of one rectification; pass the octafluoropropane raw material through the first rectification into the second rectification tower, at -5°C, 0.1MPa, and the vent flow is 0.7Nm 3 Secondary rectification is carried out under the condition of / h; the rectified octafluoropropane raw material is placed at a temperature of -55°C, and the second adsorbent used includes CO 2 The special adsorbent is the second adsorbent a and the molecular sieve mixed with 4A and 13X molecular sieve at 1:1.2 is the second adsorbent b for low-temperature adsorption; Under pressure c...

Embodiment 3

[0097] Pass the octafluoropropane raw material into the normal temperature adsorber equipped with a molecular sieve mixed with 5A and 13X molecular sieve at 1:1 as the first adsorbent for normal temperature adsorption; pass the octafluoropropane raw material adsorbed at normal temperature into the first In the rectification tower, at -10°C, 0.5MPa, the vent flow is 1.8Nm 3 Carry out a rectification under the condition of one rectification; pass the octafluoropropane raw material through the first rectification into the second rectification tower, at -20°C, 0.2MPa, and the vent flow rate is 1.0Nm 3 Secondary rectification is carried out under the condition of / h; the second adsorbent used includes CO 2 The special adsorbent is the second adsorbent a and 5A molecular sieve is used as the second adsorbent b for low-temperature adsorption; the octafluoropropane raw material that has undergone low-temperature adsorption is under the pressure condition of 1.2MPa, and is made of 5A a...

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Abstract

The invention discloses an octafluoropropane purifying method. The octafluoropropane purifying method comprises the following steps: carrying out normal-temperature adsorption on an octafluoropropane material under a normal-temperature condition; carrying out distillation on the octafluoropropane material adsorbed at the normal temperature under conditions with the temperature of -37 DEG C-10 DEG C and pressure of 0.1 MPa-0.6 MPa; carrying out low-temperature adsorption on the distilled octafluoropropane material at the temperature ranging from-100 DEG C to -30 DEG C; carrying out pressurized adsorption on the low-temperature adsorbed octafluoropropane material under the pressure condition of 0.5 MPa-1.5 MPa to obtain an octafluoropropane product. The octafluoropropane purifying method disclosed by the invention is adopted, so that not only most of fluorine-chlorine-carbon compound-containing impurities are removed, but also a problem that removing depth for carbon dioxide and carbon in the prior art is not enough is solved, thus energy consumption is lowered, adsorption effect of an adsorbent is strengthened and the purity of the octafluoropropane product is over 99.999%.

Description

technical field [0001] The invention relates to gas separation technology, in particular to a method for purifying octafluoropropane. Background technique [0002] High-purity octafluoropropane (5N) is mainly used as a cleaning gas and etchant in the semiconductor manufacturing process, such as in the plasma etching process, as an etching gas for silicon dioxide film and phosphosilicate glass mold. and since its decomposition efficiency is C 2 f 6 Twice that of C 2 f 6 replacement of. In recent years, with the rapid development of the semiconductor industry, the requirements for the purity of electronic special gas are getting higher and higher. High-purity octafluoropropane is a necessary medium for processing VLSI and plays an important role in the development of the semiconductor industry. [0003] In addition to air, water, carbon dioxide, and carbon tetrafluoride, the crude octafluoropropane prepared by existing methods such as direct fluorination and catalytic flu...

Claims

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Application Information

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IPC IPC(8): C07C19/08C07C17/38
Inventor 杜汉盛马建修石平湘
Owner FOSHAN HUATE GASES
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