Domical microwave plasma chemical vapor deposition diamond film device

Abstract

The invention relates to a domical microwave plasma chemical vapor deposition diamond film device which is suitable for quick preparation of a high-quality diamond film in the presence of high-power microwave input. A resonant cavity main body is composed of a domical reflecting body, a metal sheet reflecting body, a quartz ring window, a cylindrical reflecting body and a deposition platform, wherein the metal sheet reflecting body can block spreading of microwave to the top of the resonant cavity, so that more microwave can be accumulated above a substrate; the deposition platform is divided into a central deposition platform and a marginal deposition platform, and the independent vertical moving functions of the central deposition platform and the marginal deposition platform are beneficial to realize quick optimization of a plasma state; and the quartz ring window is hidden in a slit formed by the wall of the resonant cavity, thus avoiding etching of plasma and being beneficial to improve the vacuum performance of the resonant cavity. Besides, the favorable design of a water cooling system ensures the high-power operating safety of the equipment. So many advantages are combined, so that the domical microwave plasma chemical vapor deposition device has a capability of depositing a high-quality diamond film at high speed under a high power level.

Description

technical field [0001] The invention belongs to the technical field of chemical vapor deposition, and provides a dome-type microwave plasma chemical vapor deposition device, which is suitable for depositing high-quality diamond films under high power. Background technique [0002] The chemical vapor deposition method of depositing solid materials on the surface of the substrate through the chemical reaction of the reactive gas is a good method for preparing uniform thin film materials. Among them, the hot wire method, DC arc spray method, and microwave plasma method have been successfully applied to diamond films. preparation. [0003] The diamond film material integrates a variety of excellent properties, such as high hardness, high thermal conductivity, high light transmittance, high resistivity, etc., and can be used to make wear-resistant coatings, acoustic diaphragms, optical windows, and high thermal conductivity of integrated circuits. Substrate etc. According to di...

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Problems solved by technology

The dome-type MPCVD device has a reasonable quartz microwave window design, a double tuning mechanism, a good water cooling system, and there is no phenomenon of impurity carbon depositor walls, which fundamentally solves the problem of various existing MPCVD diamond film deposition devices. Problems in the process of preparing high-quality diamond films under high power

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