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Preparation method of SiF4

A gaseous, mixture technology, applied in the direction of halogenated silicon compounds, halogenated silanes, etc., can solve the problems of high cost, high consumption of concentrated sulfuric acid and fluorite powder, high price of anhydrous hydrofluoric acid, etc., and achieve the effect of reducing the preparation cost.

Active Publication Date: 2014-04-09
贵州天合国润高新材料科技有限公司
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  • Application Information

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Problems solved by technology

[0004] However, in the above two methods, the first method needs to consume a large amount of concentrated sulfuric acid and fluorite powder; the price of anhydrous hydrofluoric acid used in the second method is high; therefore, in the related art, the preparation of SiF 4 The method has the disadvantage of high cost

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  • Preparation method of SiF4
  • Preparation method of SiF4
  • Preparation method of SiF4

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Experimental program
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preparation example Construction

[0017] A SiF provided by the present invention 4 The preparation method comprises the following steps:

[0018] Step 101: mixing silicon-containing mineral raw materials or silicon-containing metal oxides with fluoride to obtain a mixture;

[0019] After the silicon-containing mineral raw material or silicon-containing metal oxide is mixed with the fluoride, a mixture to be reacted is obtained for subsequent preparation operations.

[0020] Step 102: reacting the mixture to obtain gaseous SiF 4 ;

[0021] After obtaining the mixture, react the mixture to obtain gaseous SiF 4 .

[0022] This method is used in the preparation of SiF 4 In the process, the raw materials used are silicon-containing mineral raw materials or silicon-containing metal oxides and fluorides, and the raw materials are much cheaper than traditional raw materials (concentrated sulfuric acid and fluorite powder or anhydrous hydrofluoric acid), thereby reducing SiF 4 preparation cost.

[0023] In addit...

Embodiment 1

[0036] Embodiment 1: with fly ash and NH 4 F as raw material to prepare high-purity SiF 4

[0037] Step 301: Fly ash (Al 2 o 3 · nSiO2 2 ) and NH 4 F mixed evenly to obtain a mixture;

[0038] Among them, NH 4 F accounts for the weight percent of mixture is 30%;

[0039] Step 302: Calcining the mixture at 600°C for 3 hours to obtain gaseous SiF 4 ;

[0040] Step 303: the gaseous SiF 4SiF with a purity of 99.0% was obtained after gas-liquid separation, concentrated sulfuric acid drying, molecular sieve adsorption and condensation purification. 4 gas.

[0041] In this example, the chemical reaction that takes place is as follows:

[0042] SiO 2 +4NH 4 F→SiF 4 ↑+4NH 3 ↑+2H 2 o

Embodiment 2

[0043] Embodiment 2: with coarse particle SiO 2 and CaF 2 Preparation of high-purity SiF as raw material 4

[0044] Step 401: Granular SiO with a particle size of 95-500 mesh 2 and CaF with particle size less than 7mm 2 Mix well to get a mixture;

[0045] Among them, CaF 2 The weight percentage that accounts for mixture is 40%;

[0046] Step 402: calcining the mixture at 1100°C for 2 hours to obtain gaseous SiF 4 ;

[0047] Step 403: the gaseous SiF 4 SiF with a purity of 99.9% was obtained after gas-liquid separation, concentrated sulfuric acid drying, molecular sieve adsorption and condensation purification. 4 gas.

[0048] In this example, the chemical reaction that takes place is as follows:

[0049] SiO 2 +2CaF 2 →SiF 4 ↑+2CaO

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Abstract

The invention relates to the field of chemical industry and particularly relates to a preparation method of SiF4. The preparation method of SiF4 comprises the following steps: mixing a raw material containing silicon minerals or a silicon-containing metal oxide with fluoride to obtain a mixture; reacting the mixture to obtain gaseous SiF4. According to the preparation method of SiF4 provided by the invention, the cost of the raw materials is much lower than that of traditional raw materials (concentrated sulfuric acid and fluorite powder or anhydrous hydrofluoric acid), so that the preparation cost of SiF4 is further reduced.

Description

technical field [0001] The invention relates to the field of chemical industry, in particular to a SiF 4 method of preparation. Background technique [0002] Silicon tetrafluoride (SiF 4 ) is an important basic chemical product, SiF 4 It can be used as etchant for silicon nitride, tantalum silicide, etc., P-type dopant, epitaxial deposition diffusion silicon source, etc., and can also be used for the preparation of electronic grade silane or silicon. SiF 4 It is a synthetic material of organosilicon compounds, used in the manufacture of fluosilicic acid and silicon fluoride, hardener of cement and artificial marble, and also used in plasma etching, solar cells, copier photosensitive cylinders, amorphous silicon film formation and chemical vapor deposition Accumulate and so on. SiF 4 It is also the raw material of high-purity quartz glass for optical fiber. In addition, SiF 4 It is also widely used in the preparation of fluorosilicic acid and aluminum fluoride, chemic...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/107
Inventor 李丹阳杨先金刘瑞龚亚云林乐洪章林
Owner 贵州天合国润高新材料科技有限公司