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ZnO-based film and preparation method thereof

A thin film, zn1-xmxo technology, applied in the field of ZnO-based thin film and its preparation, can solve the problems of difficult to effectively control the morphology of ZnO-based nanomaterials, poor repeatability of ZnO-based nanomaterials, low electron mobility, etc., and achieve good response , easy operation, large specific surface area effect

Inactive Publication Date: 2014-04-09
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Generally speaking, the maintenance period of these methods is relatively long, or it is difficult to effectively control the morphology of ZnO-based nanomaterials.
For example, the traditional CVD method to prepare ZnO-based nanomaterials has poor repeatability, and it is difficult to dope other atoms to improve the properties of ZnO nanomaterials.
For example, the hydrothermal preparation of Al-doped ZnO nanorods is difficult to achieve effective doping at low temperature (< 200 °C), resulting in low electron mobility, which limits the application of ZnO:Al nanorods in devices.

Method used

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  • ZnO-based film and preparation method thereof
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  • ZnO-based film and preparation method thereof

Examples

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example 1

[0023] Example 1: Preparation of ZnO:Al film embedded with ZnO:Al nanosheets.

[0024] 1) ZnO, Al with a purity of 99.99% 2 o 3 Powder as raw material, according to Zn 0.96 Al 0.04 O stoichiometric ratio Zn:Al = 0.96:0.04 ratio, respectively weigh 30.00 g of ZnO powder, Al 2 o 3 Powder 0.7831 g. Pour the weighed powder into a ball mill jar equipped with agate balls and ethanol, and mill it on a ball mill for 72 hours to make the powder fine and evenly mixed. Then separate the raw material and dry it at 80°C for 24 hours, add a binder and grind it, and press it into a disc shape with a diameter of about 2 inches and a thickness of 3 mm. Put the shaped green body into a sintering furnace and sinter at 1200 °C for 12 hours to obtain the desired ceramic target.

[0025] 2) Using the magnetron sputtering method, using the ceramic target in step 1) as the target, deposit a layer of ZnO:Al thin film on the cleaned glass substrate, the deposition conditions are: the distance ...

example 2

[0029] Example 2: Preparation of ZnO:In thin films embedded with ZnO:In nanosheets.

[0030] 2) ZnO with a purity of 99.99%, In 2 o 3 Powder as raw material, according to Zn 0.98 In 0.02 O stoichiometric ratio Zn:In = 0.98:0.02 ratio, weigh 30.00 g of ZnO powder, In 2 o 3 Powder 1.0444g. Pour the weighed powder into a ball mill jar equipped with agate balls and ethanol, and mill it on a ball mill for 72 hours to make the powder fine and evenly mixed. Then separate the raw material and dry it at 80°C for 24 hours, add a binder and grind it, and press it into a disc shape with a diameter of about 2 inches and a thickness of 3 mm. Put the shaped green body into a sintering furnace and sinter at 1250°C for 12 hours to obtain the desired ceramic target.

[0031] 2) Using the magnetron sputtering method, using the ceramic target in step 1) as the target, deposit a layer of Zn on the cleaned glass substrate 0.98 In 0.02 O thin film, the deposition conditions are: the dis...

example 3

[0033] Example 3: Preparation of a ZnMgO thin film embedded with ZnMgO nanosheets.

[0034] 1) Using ZnO and MgO powders with a purity of 99.99% as raw materials, according to Zn 0.90 Mg 0.10O stoichiometric ratio Zn:Mg = 0.90:0.10 ratio, weigh 30.00 g of ZnO powder and 1.6509 g of MgO powder respectively. Pour the weighed powder into a ball mill jar equipped with agate balls and ethanol, and mill it on a ball mill for 72 hours to make the powder fine and evenly mixed. Then separate the raw material and dry it at 80°C for 24 hours, add a binder and grind it, and press it into a disc shape with a diameter of about 2 inches and a thickness of 3 mm. Put the shaped green body into a sintering furnace and sinter at 1300°C for 12 hours to obtain the desired ceramic target.

[0035] 2) Using the magnetron sputtering method, using the ceramic target in step 1) as the target, deposit a layer of Zn on the cleaned quartz substrate 0.90 Mg 0.10 O thin film, the deposition condit...

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Abstract

The invention discloses a ZnO-based film. A ZnO-based nanosheet is embedded into the ZnO-based film; the chemical formulas of the ZnO-based film and the ZnO-based nanosheet are Zn[1-x]MxO, M is Al, Ga, In, B, Cd or Mg; x is smaller than 0.20 and greater than or equal to 0; the diameter of the nanosheet is 1-5 microns. The preparation method comprises the following steps: weighing pure ZnO powder and pure M oxide powder according the metering ratio of the chemical formulas Zn[1-x]MxO, preparing a ZnO-based ceramic target; depositing a ZnO-based film on a substrate by using a magnetron sputtering method, and then putting into a corrosive agent to corrode; forming a ZnO:Al nanosheet on the surface of the ZnO:Al film by corrosive liquid after corroding along the crystal boundary in an orientation manner. The ZnO-based nanosheet has large specific surface area, so that the ZnO-based film has a good response on light, a gas, an organic matter and the like. The ZnO-based film is simple in preparation technology, good in repeatability, easy to operate and low in cost.

Description

technical field [0001] The invention relates to a ZnO-based thin film and a preparation method thereof. Background technique [0002] At present, ZnO-based materials have been widely used in catalysis, gas sensors, ultraviolet detectors, light-emitting diodes, field effect transistors, thin-film transistors, touch screens, solar cells and other fields. Doping of ZnO-based materials can greatly enhance its applications. For example, doping elements such as Al, In, Ga, B, and F in ZnO thin film materials can prepare n-type ZnO thin films with good conductivity, while doping Li, Na, K, N, P and other elements can prepare p-type ZnO thin films. And doping Co, Cu, Ni and other elements can prepare dilute magnetic semiconductors. These different degrees of doping directly determine the application of ZnO-based materials in a certain field. [0003] The preparation methods of ZnO-based nanomaterials are generally biased towards chemical synthesis, including water bath, chemical ...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/08
Inventor 吕建国江庆军袁禹亮叶志镇
Owner ZHEJIANG UNIV
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