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Anti-reflection glass substrate as well as preparation method and application thereof

A technology of anti-reflection glass and glass substrate, which is applied in the field of anti-reflection glass substrate and its preparation, can solve the problems of easy adsorption, large transmittance attenuation, lower film quality and optical performance, etc., and achieve high light transmittance Effect

Inactive Publication Date: 2014-05-07
HENAN ANCAI HI-TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The friction resistance of the anti-reflection film coating prepared by these methods has been well improved, but because the solar cell module will withstand the erosion of the harsh natural environment in the process of use, the anti-reflection film prepared by the above method is subjected to double 85 During the test (aging test at 85°C and 85% humidity), it was found that the water vapor resistance of the film was not good, and the transmittance attenuation was large. On this basis, if we want to continue to improve the friction resistance of the film layer, we must use The film layer is heat-treated in an ammonia atmosphere
This method takes a long time to process and cannot meet the requirements of large-scale and large-scale photovoltaic coated glass production, so it is not easy to apply in actual production
[0004] With the use of a large number of coated glasses, the importance of the stability of the coated glass process and the ease of cleaning of the coated glass has been gradually realized, not just the transmittance and its weather resistance, especially the ease of coating glass. Cleanliness; since the anti-reflection film prepared by the sol-gel method is a porous network structure, and there are strong polar groups Si-OH bonds on the surface, the coated glass is easy to absorb pollutants in the air during transportation and storage. Moisture and dirt, which degrades film quality and optical properties
In particular, the coated glass is easy to be stained with the packaging material EVA in the process of packaging with the photovoltaic module, making it difficult to wipe and even causing damage to the film layer during the wiping process
Some coated glass is easy to be stained with dirt on the transmission wheels and robotic suction cups during the transmission and handling process after being packaged with components, and it is also difficult to wipe off these dirt

Method used

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  • Anti-reflection glass substrate as well as preparation method and application thereof

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preparation example Construction

[0013] The preparation method of the anti-reflection glass substrate of the present invention comprises the following steps:

[0014] a) Preparation of anti-reflection sol: acidify the silica sol, add orthosilicate and deionized water to react to form a primary sol, then add an organic solvent, stir, seal and age; add film-forming aids and Control the drying of chemical additives and stir to obtain anti-reflection sol;

[0015] b) coating film: applying the anti-reflection sol in step a) on the surface of the glass substrate to form a glass substrate with an anti-reflection coating;

[0016] c) tempering: tempering the glass substrate in step b) to form an anti-reflection coating;

[0017] d) Applying an antifouling liquid: applying an antifouling liquid on the antireflection film layer of the glass substrate treated in step c), and forming an antifouling layer.

[0018] In step a) of the method of the present invention, the silica sol is preferably a monodisperse silica org...

Embodiment 1

[0055] Take 429g particle size is 30nm and SiO 2 The content is 2.8wt% organosilicon sol (0.2mol SiO 2 , self-made), under stirring, add commercially available concentrated hydrochloric acid dropwise to the silica sol, when the pH value reaches 3, continue stirring for 1 hour, then slowly add 20.8g (0.1mol) ethyl orthosilicate and 7.2g to Ionized water, and add 183g absolute ethanol to keep SiO 2 The content of is still 2.8wt%. After continuing to stir for 4 hours, seal it and place it in a constant temperature drying oven at 40°C for aging for 3 days; add 4.6g of dipropylene glycol monomethyl ether and 46g of N,N-dimethylformamide to the aged sol, and stir for 1 Hours, the antireflection sol was obtained.

[0056] Clean and dry the photovoltaic glass substrate (300mm*600mm, thickness 4.0mm) with deionized water, apply anti-reflection sol on the photovoltaic glass substrate with a roller coater, use a quantitative roller with a mesh number of 100 mesh, coat the roller and g...

Embodiment 2

[0058] Take 400g particle size is 20nm and SiO 2 The content is 3.0wt% organosilicon sol (0.2mol SiO 2 , self-made), add acetic acid dropwise to the silica sol under stirring, when the pH value reaches 1, continue stirring for 1 hour, then slowly add 20.8g (0.1mol) tetraethyl orthosilicate and 7.2g deionized water, And add 165g of isopropanol to keep SiO 2 The content is still 3.0wt%. After continuing to stir for 4 hours, seal it and place it in a constant temperature drying oven at 60°C for aging for 3 days; add 2.2g of dipropylene glycol monomethyl ether and 8.6g of N,N-dimethylformamide to the aged sol, stir After 1 hour, an antireflection sol was obtained.

[0059] Clean and dry the photovoltaic glass substrate (300mm*600mm, thickness 4.0mm) with deionized water, apply anti-reflection sol on the photovoltaic glass substrate with a roller coater, use a quantitative roller with a mesh number of 80 mesh, coat the roller and glass The amount of compression between the subs...

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Abstract

The invention relates to a preparation method of an anti-reflection glass substrate. The preparation method comprises the following steps: a, preparing an anti-reflection sol, namely, acidizing silica sol, adding orthosilicate to react with deionized water to form sol, then adding an organic solvent, stirring, sealing and ageing; adding a coalescing agent in the aged sol and controlling a dry chemical additive, and stirring to obtain the anti-reflection sol; b, coating, namely, applying the anti-reflection sol in the step a on the surface of a glass substrate to form a glass substrate with an anti-reflection coating; c, tempering, namely, tempering the glass substrate prepared by the step b to form an anti-reflection film layer; and d, spreading an anti-fouling solution, namely, applying the anti-fouling solution above the film layer of the glass substrate treated in the step c to form an anti-fouling layer. The invention further relates to an anti-reflection glass substrate prepared by adopting the method disclosed by the invention, and an application of the anti-reflection glass substrate.

Description

technical field [0001] The invention relates to an anti-reflection glass substrate, a preparation method and application thereof. Background technique [0002] Anti-reflection coated glass (referred to as "anti-reflection glass") is formed by coating one or more layers of anti-reflection film on the glass substrate to reduce the reflection loss of incident light on the glass surface. Photovoltaic glass is used as the upper cover glass of photovoltaic modules. Its visible light transmittance is generally 91%-92%. About 8% of the light is lost due to glass reflection and absorption. The transmittance of photovoltaic glass can be improved by anti-reflection coating. Increase the power of photovoltaic modules. Generally, the single-layer anti-reflection film increases the visible light transmittance by 2.5%-3.0%, and the corresponding photovoltaic module power increases by more than 2.0%. Therefore, most module factories have abandoned traditional photovoltaic glass and turned...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C17/34
Inventor 苍利民魏永强杨柯陈明高金海孙向阳马亚芬李江涛
Owner HENAN ANCAI HI-TECH
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