OLED array substrate, manufacturing method thereof, display panel and display device

A technology of array substrates and substrates, which is applied in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., and can solve the problems of multiple preparation processes of reflective layers and increased reflectivity

Active Publication Date: 2014-07-23
WUHAN TIANMA MICRO ELECTRONICS CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Embodiments of the present invention provide an OLED array substrate and its preparation method, a display panel, and a display device to so

Method used

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  • OLED array substrate, manufacturing method thereof, display panel and display device
  • OLED array substrate, manufacturing method thereof, display panel and display device
  • OLED array substrate, manufacturing method thereof, display panel and display device

Examples

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Example Embodiment

[0020] Example one:

[0021] Such as figure 2 Shown here is an OLED array substrate provided by Embodiment 1 of the present invention. The OLED array substrate includes: a substrate 201, a TFT array 202 on the substrate 201, a plurality of OLED pixel units 203, and any OLED pixel unit 203 includes:

[0022] The first electrode 2031, the second electrode 2032, and the light emitting structure layer 2033 located between the first electrode 2031 and the second electrode 2032, wherein the first electrode 2031 is closer to the second electrode 2032 than the second electrode 2032. The substrate 201.

[0023] In the embodiment of the present invention, the first electrode 2031 is a film layer formed by doping a dopant substance and graphene at a set molar ratio, wherein the doping substance is a simple metal.

[0024] Preferably, the metal element is any one of silver, titanium, vanadium, iron, aluminum, zinc, tin, copper, gold or platinum.

[0025] In the embodiment of the present inventio...

Example Embodiment

[0031] Embodiment two:

[0032] Combine image 3 As shown, the method for preparing the OLED array substrate provided in the second embodiment of the present invention specifically includes the following steps:

[0033] Step 301: Provide a substrate.

[0034] The substrate may be a rigid substrate or a flexible substrate, and the present invention does not specifically limit the material of the substrate.

[0035] Step 302: forming a TFT array on the substrate.

[0036] After step 301, a thin film transistor array substrate, that is, a TFT array, is formed on the substrate. Wherein, the TFT array includes: active layer, gate, gate insulating layer, source, drain, passivation layer and other structures. The above-mentioned structure is based on the film structure technology (deposition, photolithography, etc.) in the prior art. Process) are formed sequentially, which can be a top gate structure or a bottom gate structure.

[0037] Step 303: forming a plurality of OLED pixel units on the...

Example Embodiment

[0046] Embodiment three:

[0047] Based on the OLED array substrate provided by the embodiment of the present invention, the third embodiment of the present invention also provides a display panel. The display panel includes the OLED array substrate described in the first embodiment, in addition, it also includes a packaging cover plate disposed opposite to the OLED array substrate in the prior art.

[0048] In addition, an embodiment of the present invention also provides a display device, including the display panel described in the third embodiment and other display device units in the prior art, such as a driving module, a polarizer, and the like.

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Abstract

The invention discloses an OLED array substrate, a manufacturing method of the OLED array substrate, a display panel and a display device. According to the main content of the manufacturing method, the technological process that a deposition technology is utilized three times to sequentially form an ITO layer, a metal layer and an ITO layer is avoided, and just by performing the deposition technology once, a first electrode with the reflection function and the functions of an anode can be formed with single metals and graphene doped according to a set mole ratio. While the technological process is reduced, oxidization and sulfifation of the single metals are avoided; moreover, single metal atoms in the first electrode are evenly distributed in the graphene structure, and thus the light reflectivity can be further improved effectively.

Description

technical field [0001] The invention relates to the field of display technology, in particular to an OLED array substrate and a preparation method thereof, a display panel and a display device. Background technique [0002] In organic light-emitting (OLED, Organic Light-Emitting Diode) display technology, such as figure 1 Shown is the reflective layer structure in the traditional top emission structure. Depend on figure 1 It can be seen that the reflective layer includes a first ITO layer 101, a metal layer 102, and a second ITO layer 103 from top to bottom. The material used for the first ITO layer 101 is indium tin oxide (ITO, Indium Tin Oxides), and the metal The material used for the layer 102 is metallic silver (Ag), the material used for the second ITO layer 103 is indium tin oxide (ITO, Indium Tin Oxides), and the three-layer film structure together serves as a reflective layer. Among them, the first ITO layer 101 on the uppermost layer has a thickness of 100-250A,...

Claims

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Application Information

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IPC IPC(8): H01L27/32H01L51/56
Inventor 刘海蒋卡恩姚红莉刘刚姚宇环
Owner WUHAN TIANMA MICRO ELECTRONICS CO LTD
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