Micro-flow detector based on SERS (Surface Enhanced Raman Scattering) principle and preparation method thereof

A detector and microfluidic technology, applied in the direction of Raman scattering, material excitation analysis, etc. It takes several hours or even longer to solve the problem, the distribution cannot achieve good uniformity, and affects the consistency of Raman scattering signals In order to achieve controllable detection speed, save detection time, and shorten detection time

Active Publication Date: 2014-07-30
INST OF PHYSICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

When the immersion-evaporation method is used, a layer of analyte molecules can be evenly adsorbed on the nano-rough surface or nano-structure of the open active substrate, but this method requires a large amount of reagents, and the soaking time often takes several hours. hours or more
When the titration-evaporation method is used to distribute the analyte, the required reagent dose only needs to cover the entire surface of the active substrate in the horizontal direction, but its height may reach the order of millimeters, so the reagent consumption is still relatively large; and this method is also the same It takes a long time for the solvent to evaporate; in addition

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  • Micro-flow detector based on SERS (Surface Enhanced Raman Scattering) principle and preparation method thereof
  • Micro-flow detector based on SERS (Surface Enhanced Raman Scattering) principle and preparation method thereof
  • Micro-flow detector based on SERS (Surface Enhanced Raman Scattering) principle and preparation method thereof

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preparation example Construction

[0049] According to another aspect of the present invention, also provide a kind of preparation method of the microflow detector based on SERS mechanism, such as Figures 5a-5h shown. The preparation method includes the following steps: step S1, setting the substrate 10 and forming a groove on the upper surface 11 of the substrate 10; step S2, engraving a grating structure pattern in the groove; and step S3, depositing metal in the grating structure pattern to A metal grating 20 is formed; the metal grating 20 defines a plurality of micro-channels 21 of the groove through which the substance to be measured passes. The preparation method is simple, does not require large instruments and equipment, and is suitable for large-scale production.

[0050] Such as Figures 5a-5c As shown, specifically, the step of forming a groove on the upper surface 11 of the substrate 10 in step S1 includes: step S11, coating an ultraviolet photoresist layer 14 on the upper surface 11 of the subs...

Embodiment 1

[0056] 1) Take a clean Si substrate as a base, and spin-coat an ultraviolet photoresist layer on the upper surface of the Si substrate, wherein the thickness of the ultraviolet photoresist layer is 1.5 μm.

[0057] 2) Exposing and developing the ultraviolet photoresist layer to form a groove pattern to be etched on the substrate, and etching the groove pattern to be etched by reactive ion beam etching to form a groove pattern on the upper surface of the substrate Trench with a depth of 500nm.

[0058] 3) Spin-coat electron beam photoresist in the groove with a thickness of 600nm; use electron beam exposure and development technology to process the electron beam photoresist to form a grating structure pattern; Metal Au is deposited, and a linear grating composed of multiple Au flakes is obtained in the detection area. The Au grating is flush with the upper surface of the substrate, with a period of 200 nm and a duty ratio of 0.2.

[0059] The other parts of the trench are proc...

Embodiment 2

[0062] 1) Take a clean Si substrate as a base, and spin-coat an ultraviolet photoresist layer on the upper surface of the Si substrate, wherein the thickness of the ultraviolet photoresist layer is 1.5 μm.

[0063] 2) Exposing and developing the ultraviolet photoresist layer to form a groove pattern to be etched on the substrate, and etching the groove pattern to be etched by reactive ion beam etching to form a groove pattern on the upper surface of the substrate Trench with a depth of 500nm.

[0064] 3) Spin-coat electron beam photoresist in the groove with a thickness of 600nm; use electron beam exposure and development technology to process the electron beam photoresist to form a grating structure pattern; Metal Au is deposited, and a linear grating composed of multiple Au flakes is obtained in the detection area. The vertical height x of the Au grating protruding from the upper surface of the substrate is 500nm, the period is 900nm, and the duty ratio is 0.7.

[0065] The...

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Abstract

The invention provides a micro-flow detector based on an SERS (Surface Enhanced Raman Scattering) principle and a preparation method thereof. The micro-flow detector comprises at least one micro-flow channel structure, and each micro-flow channel structure comprises a base and a metal optical grating, wherein the base comprises an upper surface and a groove; the groove is recessed down from the upper surface; a detection area is formed in the groove; the metal optical grating is formed in the detection area of the groove and used for defining a plurality of micro-flow channels of the groove; substances to be detected flow through the micro-flow channels. The metal optical grating is integrated in the micro-flow structure, so that the micro-flow detector based on the SERS principle is used for enhancing raman signals of molecules of the substances to be detected in an exponential form, and the increase amplitude is further higher than the sensitivity of detection with a metal optical grating based on the SERS principle, so that the micro-flow detector based on the SERS principle is more suitable for detection on molecule signals with ultra-low concentration. In addition, the micro-flow detector is good in controllability and is small in size and convenient to carry.

Description

technical field [0001] The invention relates to the technical field of micro-nano structure devices, in particular to a micro-flow detector based on the SERS mechanism and a preparation method thereof. Background technique [0002] When light is scattered by atoms or molecules, most of the photons are elastically scattered, that is, the frequency of the scattered light is the same as that of the incident light, which is called Rayleigh scattering; The frequency is different from the incident light, also known as Raman scattering. [0003] Raman scattering can accurately reflect the information of the vibration energy level of molecules, so it is regarded as the "fingerprint" of molecules and is widely used in the detection of substances. At the same time, Raman scattering spectroscopy detection is a method of material structure analysis that does not require labeling of the sample to be detected, and has the characteristics of non-destructive and contact-free. With the dev...

Claims

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Application Information

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IPC IPC(8): G01N21/65
Inventor 徐红星沈昊
Owner INST OF PHYSICS - CHINESE ACAD OF SCI
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