Graphene-based electronically controlled terahertz anti-reflection film and preparation method thereof
An anti-reflection film and graphene technology, applied in the field of terahertz band devices, can solve the problems of too large difference in thickness of the anti-reflection film, narrow working frequency band, poor stability, etc., to ensure the service life and application range, and high chemical stability. , the effect of expanding the scope of application
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Embodiment 1
[0077] figure 1 Shown is a schematic diagram of the basic structure of an electronically controlled anti-reflection film composed of two graphene layers, which is a schematic view of the structure viewed from the side. The device has a three-layer structure, including two layers of graphene layers 1 and 3, and a dielectric layer 2 that completely separates adjacent graphene layers. The electrode 4 is connected between the graphene layer 1 and the graphene layer 3 and applied with a voltage 5. for adjustment.
Embodiment 2
[0079] figure 2 Shown is a schematic diagram of the basic structure of an electrically controlled anti-reflection film composed of four graphene layers, which is a schematic diagram of the structure viewed from the side. The anti-reflection film has a 7-layer structure, including 7 layers of graphene, and a dielectric layer 2 that completely separates adjacent graphenes. Viewed from top to bottom in the figure, the first and third graphene layers are respectively connected to one electrode, and the second and fourth graphene layers are respectively connected to the other electrode. The voltage on these two electrodes is 5, odd-numbered layers It has the same potential as the even-numbered graphene layers, and a voltage of 5 can be applied to adjust the conductivity of each graphene layer. exist figure 2 In , the electrodes are not shown. In practical applications, the connection between conductive wires and graphene should be realized by making electrodes.
[0080] In act...
Embodiment 3
[0082] In this example, we selected the following devices to prepare terahertz anti-reflection coatings with different numbers of graphene layers:
[0083] Graphene sample (fixed) parameters: area 1cm 2 , carrier scattering probability 100cm -1 , Fermi velocity v F =1.1×10 6 m / s, test temperature: 300K, preparation method: CVD.
[0084] (non-fixed) parameters of graphene: number of layers: 2, 4, 6 voltage: 0 ~ 80V.
[0085] Dielectric layer: SiO 2 , thickness: 50nm; method: magnetron sputtering, refractive index: 1.5.
[0086] Electrodes: copper, magnetron sputtering.
[0087] The frequency of the incident terahertz wave is 1 THz. The Fermi energy level of graphene is 0eV and -0.315eV, and the corresponding voltage is adjusted from 0V to 80V, which is the upper and lower limits of the change of the Fermi energy level of graphene.
[0088] The substrate used to verify the anti-reflection performance is high-resistance silicon with a thickness of 500 μm and a refractive ...
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