Preparation method of modified zirconium silica sol ceramic polishing liquid

Abstract

The invention discloses a preparation method of a modified zirconium silica sol ceramic polishing liquid, and the preparation method includes the following steps: 1), a fluorine-containing surfactant is added into silica sol to form a system A, wherein the particle size of the silica sol is 5-20nm, the PH = 9.5-10.5, the mass fraction of silica is 10-30%, and the mass fraction of the silica sol in the system A is 95-99.9%; 2), the system A is stirred and heated up to 50-100 DEG C, then zirconium sol and fluorosilicate are added into the system A to form a system B, wherein the particle size of the zirconium sol is 10-20nm, the mass fraction of zirconia is 10-20%, and PH = 2-9, and the weight ratio of system A to zirconium sol to fluorosilicate is 98-99.45: 0.5-1:0.05-1; and 3), the system B is stirred, a waterproof agent accounting for 0.1-3% by weight of the system B is added, and the pH is regulated to 9.5-11. The modified zirconium silica sol ceramic polishing liquid prepared by the preparation method has the advantages of low production cost, long stable storage time, strong hardness and good polishing effect.

Description

technical field [0001] The invention relates to the technical field of ceramic material manufacturing, in particular to a method for preparing a modified zirconium silica sol ceramic polishing liquid. Background technique [0002] There are many small unevennesses on the glazed surface of coarse ceramic floor tiles, which cause the roughness of the glazed surface of ceramic tiles to be large, but in practice, the glossiness of the glazed surface of ceramic floor tiles is required to be very high (above 90). Polishing the glazed surface of ceramic floor tiles through the principle of mechanochemical polishing can achieve the desired glossiness. Mechanochemical polishing uses the dual effects of mechanical friction and chemical decomposition, such as the combination of grinding wheel and polishing liquid to grind and polish the glaze of ceramic floor tiles, so that the gloss of the glaze can reach more than 90%. The polishing liquid used contains abrasive grains, surfactants,...

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Problems solved by technology

[0003] The existing materials for ceramic polishing either have poor polishing effect, high cost, or inconvenient storage. For example, the patent No. 200810030197.8 domestic patent invention discloses a ceramic tile polishing method, wherein the abrasive is cerium oxide powder, oxidized Cerium is insoluble in water and easy to coagulate, and cannot be evenly distributed in water. At the same time, the price of cerium oxide is relatively expensive, and the production cost is high, which is not conducive to marketization

In addition, the invention patent application number 201310460945.7 discloses a high-efficiency ceramic polishing solution. The pH value of silica sol is 3.0-9.0. However, the pH value is between 4.0-7.0. The storage stability of silica sol is short, and it is easy to gel, which is not conducive to processing.

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