Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Superhydrophilic microwell sensing interface for enrichment and trace detection and its preparation method

A sensing interface and super-hydrophilic technology, applied in chemical instruments and methods, laboratory containers, color/spectral characteristic measurement, etc., can solve the problems of real-time tracking of difficult-to-target micro-droplets and easy rolling of droplets, etc. Achieve the effects of pollution-free preparation process, low cost, simple equipment and process

Active Publication Date: 2016-02-03
UNIV OF SCI & TECH BEIJING
View PDF6 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, the droplet is unstable and easy to roll at the superhydrophobic sensing interface, so this single superhydrophobic nanostructure constructed only through low surface energy chemical modification is not easy to track the target micro-droplet in real time, and it is not easy to achieve fixed-point controllable target molecules. detection

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Superhydrophilic microwell sensing interface for enrichment and trace detection and its preparation method
  • Superhydrophilic microwell sensing interface for enrichment and trace detection and its preparation method
  • Superhydrophilic microwell sensing interface for enrichment and trace detection and its preparation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] (1) Soak 2×1 square centimeter glass pieces in hot Piranha solution (98% concentrated sulfuric acid / 30% hydrogen peroxide, V / V=7:3) for 1 hour. After cooling, ultrasonically clean with acetone, ethanol, and deionized water for 10 minutes, respectively. Finally, blow it off with nitrogen and dry it in a drying oven; light the candle (avoid using the wax head for new candles, and do not use the wax tail for too short candles). After the flame is stable, use tweezers to pick up the clean glass piece at a constant speed ( 2cm / s) over the stable burning flame and repeatedly translate 7 times, the glass surface will physically deposit a layer of uniformly distributed carbon nanoparticles with a thickness of about 10 microns. Take 2 milliliters of tetraethoxysilane and 2 milliliters of ammonia water in a small beaker of 5 milliliters respectively, then put the glass sheet deposited with carbon nanoparticles and the two small beakers into a desiccator respectively, and place th...

Embodiment 2

[0040] (1) Soak a 2×1 square centimeter quartz plate in hot Piranha solution (98% concentrated sulfuric acid / 30% hydrogen peroxide, V / V=7:3) for 1 hour. After cooling, ultrasonically clean with acetone, ethanol, and deionized water for 10 minutes, respectively. Finally, blow it off with nitrogen and dry it in a drying oven; light a candle (avoid using a wax head for a new candle, and do not use a wax tail for a candle that is too short), and after the flame is stable, use tweezers to pick up a clean quartz piece at a constant speed ( 2cm / s) over the stable burning flame and repeatedly translate 7 times, the surface of the quartz plate will physically deposit a layer of uniformly distributed carbon nanoparticles with a thickness of about 10 microns. Take 2 milliliters of tetraethoxysilane and 2 milliliters of ammonia water in a small beaker of 5 milliliters respectively, then put the quartz sheet with deposited carbon nanoparticles and two small beakers into a desiccator respec...

Embodiment 3

[0049] (1) Soak 2×1 square centimeter silicon wafers in hot Piranha solution (98% concentrated sulfuric acid / 30% hydrogen peroxide, V / V=7:3) for 1 hour. After cooling, ultrasonically clean with acetone, ethanol, and deionized water for 10 minutes, respectively. Finally, blow it off with nitrogen and dry it in a drying oven; light a candle (avoid using a wax head for a new candle, and do not use a wax tail for a candle that is too short), and after the flame is stable, use tweezers to pick up a clean silicon wafer at a constant speed ( 2cm / s) over the stable burning flame and repeatedly translate 7 times, the surface of the silicon wafer will physically deposit a layer of uniformly distributed carbon nanoparticles with a thickness of about 10 microns. Take 2 milliliters of tetraethoxysilane and 2 milliliters of ammonia water in a small beaker of 5 milliliters respectively, then put the silicon wafer and two small beakers deposited with carbon nanoparticles into a desiccator res...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
diameteraaaaaaaaaa
pore sizeaaaaaaaaaa
Login to View More

Abstract

The invention relates to a super-hydrophilic micro-well sensing interface for enrichment and trace detection and a preparation method of the super-hydrophilic micro-well sensing interface. The method comprises the following steps: repeatedly translating a clean substrate above candle flame at constant speed, carrying out physical deposition on the surface of the substrate to obtain uniformly-distributed carbon nanolayers with a certain thickness, carrying out chemical vapor deposition on silicon dioxide by taking the substrate as a template, and thus obtaining a nano-composite structure with carbon particles being coated by the silicon dioxide; calcining at high temperature to remove carbon cores, and thus obtaining a uniform hollow nano silicon dioxide layer with a micron thickness; after treating the surface of nano silicon dioxide by a plasma, modifying a silanization reagent on the surface by adopting a monomolecular-film self-assembly method; covering a circular photomask plate, and carrying out ultraviolet light degradation on the silanization reagent in the uncovered area by adopting a photoetching technique to obtain the super-hydrophilic micro-well sensing interface for enrichment and trace detection. By utilizing the advantage of a controllable patterning designated limited range, a super-hydrophilic micro-well has good concentration and enrichment effects on micro droplets of an extremely dilute solution and can be used for real-time trace detection of target molecules.

Description

technical field [0001] The invention belongs to the field of nanomaterials, functional materials and biosensing interface materials, and relates to a novel sensing interface and a manufacturing method thereof, in particular to a superhydrophilic microwell sensing interface for enrichment and trace detection and its preparation method for real-time trace detection. Background technique [0002] The construction of interface materials has always been one of the core issues in biosensor research. In recent years, scientists have done a lot of work on the structure and performance regulation of sensing interface materials, which has laid a foundation for the improvement of the performance of biosensors. [0003] In terms of the structure of interface materials, nanostructures are introduced. Nanomaterials are widely used in biosensors due to their large specific surface area, good chemical stability and biocompatibility, and strong adsorption capacity. [0004] In terms of th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B01L3/00G01N21/64G01N21/25
Inventor 许利苹陈艳霞王树涛
Owner UNIV OF SCI & TECH BEIJING
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products