Dewaxing cleaning agent for sapphire substrate

A sapphire substrate and cleaning agent technology, which is applied in the direction of detergent compounding agent, detergent composition, surface active detergent composition, etc., can solve the problems of large environmental impact, long cleaning time, and low cleaning yield rate

Inactive Publication Date: 2014-12-03
天津西美半导体材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, there are three main types of dewaxing cleaning agents for sapphire substrates: solvent type, semi-aqueous type and water-based type. Liquid is difficult to handle and other problems; and most of the sapphire substrates currently have the following disad

Method used

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Embodiment Construction

[0013] In order to further understand the content, characteristics and effects of the present invention, the following examples are given hereby, and the details are as follows:

[0014] Contain starch glycoside surfactant, other surfactants, cosolvent, metal complex, suspending agent, water softening agent or antihard water agent, sapphire substrate corroding agent and appropriate amount in the sapphire substrate of this implementation state. of pure water.

[0015] The present invention will be described below with specific examples.

[0016] According to needs, add respectively the starch glycoside surfactant of weight 7% in pure water, 5% fatty alcohol polyoxyethylene (9) ether, 4% sodium dodecylbenzenesulfonate, 4% urea, 4% % sodium citrate, 0.8% sodium carboxymethyl cellulose, 0.1% water glass, 0.5% polyoxyethylene ether sulfate and 15% sapphire substrate etchant and pure water to prepare 1KG sapphire substrate Wax cleaner. Then this polishing liquid stock solution is...

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PUM

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Abstract

The invention relates to a preparation method of a dewaxing cleaning agent for a sapphire substrate, and is characterized in that the dewaxing cleaning agent for the sapphire substrate contains a starch glycoside surfactant, other surfactants, a cosolvent, a metal complex, a suspending agent, a water quality softener or a hard water resistant agent, a corrosion inhibitor and pure water; the dewaxing cleaning agent for the sapphire substrate is characterized by containing 5-15 wt% of the starch glycoside surfactant, 5-20 wt% of the other surfactants, 3-5 wt% of the cosolvent, 3-5 wt% of the metal complex, 0.01-1 wt% of the water quality softener or the hard water resistant agent, 0.5-1 wt% of the suspending agent, 10-20 wt% of a sapphire substrate corrosive agent and a proper amount of pure water; the dewaxing cleaning agent for the sapphire substrate is a water-based environmentally-friendly cleaning agent, and the cleaning agent can be degraded by self within 15 days after cleaning; and the cleaning requirement can be reached just with cleaning for one time, the production efficiency is improved, and with addition of the corrosion inhibitor, the cleaning agent is ensured not to cause severe corrosion to the sapphire surface in the cleaning process.

Description

technical field [0001] The invention relates to a preparation method of a wax-removing cleaning agent for a sapphire substrate. Background technique [0002] Sapphire single crystal (Sapphire), also known as white gemstone, is transparent and has the same optical properties, mechanical properties and chemical properties as natural gemstones. It has good thermal properties, excellent electrical properties and dielectric properties, and is chemically resistant. , high infrared transmittance, good wear resistance, hardness second only to diamond, Ta Mok's 9, still has good stability at high temperature, melting point is 2030 ℃, so it is widely used in industry , national defense, scientific research and other fields, such as optoelectronics, communications, GaN light-emitting diode (LED) substrates, military missile warhead shells, precision instruments and meters, infrared light-transmitting materials in the aerospace industry, laser windows and mirrors, semiconductor silicon ...

Claims

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Application Information

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IPC IPC(8): C11D1/831C11D3/26C11D3/04C11D3/37C11D3/10C11D3/60
Inventor 高如山
Owner 天津西美半导体材料有限公司
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