Large-area high-density nuclear track nano-pore membrane, as well as equipment and method for preparing large-area high-density nuclear track nano-pore membrane

A nuclear track and nanopore technology, which is applied in the field of preparing large-area high-density nuclear track nanoporous membranes, can solve the problems of difficult uniform etching of films, uncontrollable etching rate, high track density, etc., and achieve excellent anti-reflection performance , Accelerate the etching rate, the effect of high hole density

Active Publication Date: 2015-01-28
CHINA INSTITUTE OF ATOMIC ENERGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

ZL200612100299.X patent mentions a preparation method of anti-reflective materials. In the visible light region (400nm-800nm), the reflectance of the surface of the polyester nuclear track film sample treated by irradiation etching coating is higher than that of the sample without any treatment. The reflectivity of the material has been reduced by 98%. After years of research by Liu Cunxiong, etc., the materials developed have achieved a reflectivity of less than 1% in the visible-ultraviolet-mid-infra

Method used

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  • Large-area high-density nuclear track nano-pore membrane, as well as equipment and method for preparing large-area high-density nuclear track nano-pore membrane
  • Large-area high-density nuclear track nano-pore membrane, as well as equipment and method for preparing large-area high-density nuclear track nano-pore membrane
  • Large-area high-density nuclear track nano-pore membrane, as well as equipment and method for preparing large-area high-density nuclear track nano-pore membrane

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Effect test

Embodiment 1

[0048] see figure 1 As shown, it is a functional block diagram of Embodiment 1 of the equipment for preparing large-area high-density nuclear track nanoporous membranes in the present invention, and the equipment includes:

[0049] An etching generating device 1, which is used to contain an etching solution and fix the ion-irradiated sneaking track film in the etching solution for etching, so that the diving track film is uniformly etched;

[0050] An ultrasonic generator 2 is used to strip off the etching products remaining in the track holes in time to accelerate the etching rate;

[0051] An ultraviolet lamp 3 is used for radiation sensitization of the submerged track film to accelerate the etching rate.

Embodiment 2

[0053] see figure 2 As shown, it is a functional block diagram of Embodiment 2 of the equipment for preparing a large-area high-density nuclear track nanoporous membrane in the present invention. As described in Embodiment 1, the difference between this embodiment and it is that the equipment also includes:

[0054] An etching generating device 1 is used to contain an etching solution and fix the submerged track film irradiated with ions in the etching solution for etching;

[0055]An ultrasonic generator 2, which provides ultrasonic waves to the etching generating device 1, in order to strip off the etching products remaining in the track holes in time, thereby accelerating the etching rate;

[0056] A UV lamp 3 is used to sensitize the submerged track film to accelerate the etching rate.

[0057] Wherein, the etching generating device 1 includes:

[0058] A clamping part 11 is used to clamp and fix the submerged track film. When the ultraviolet lamp 3 is used for sensitiz...

Embodiment 3

[0061] As described in Embodiment 2, the difference of this embodiment is that the clamping part 11 described in the etching generating device 1 is a carrier film clip, and the carrier film clip is designed as two sub-clamps and a mother clip superimposed on the together, see image 3 As shown, it is the top view, left view and front view of the film-carrying clip clip in the present invention, Figure 4 As shown, it is the top view, left view and front view of the mother clip of the film carrier clip in the present invention. Both the sub clip and the mother clip are frame-type structures, hollow, and the cross section of the frame is an inverted L shape. The bottom of the mother clip frame is provided with a first extension plate inwards around the edge to support the submerged track film. The above-mentioned sub-clip is matched with the mother clip, and the same position as the frame of the sub-clip and the mother clip is provided with a drill hole, and the sub-clip and th...

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Abstract

The invention relates to equipment and method for preparing a large-area high-density nuclear track nano-pore membrane. The equipment comprises an etching generation device, wherein the etching generation device comprises a clamping part and a liquid holding part; the clamping part is used for clamping a latent track film and is fixed on the liquid holding part filled with etching liquid; an intermittent ultrasonic action is provided by utilizing an ultrasonic generator, and an etching product remained in track holes can be peeled in time; the latent track film is subjected to radiating sensitization by utilizing an ultraviolet lamp, and the etching speed is accelerated. According to the equipment and method, uniform etching of the film can be realized; the etching product is peeled by utilizing ultrasonic waves, so that the etching liquid and the latent track can be sufficiently contacted, and the etching speed of the track can be accelerated; the film is protected against the broken risk due to long-time vibration of the ultraviolet waves by adopting the intermittent ultrasonic action; and the track nano-porous film has excellent reflection resistance, and has wide application range due to the large area and high pore density.

Description

technical field [0001] The invention relates to the field of nuclear track pore membranes, in particular to a device, method and membrane for preparing large-area and high-density nuclear track nanoporous membranes. technical background [0002] Nuclear track membrane (belonging to solid nuclear track technology) has shown important application value in the fields of membrane separation, anti-counterfeiting technology, medicine and health care, electronics industry, and environmental science. In the 1980s, solid nuclear track technology was used for surface modification of materials. For example, it was mentioned in "Applied Optics" in 1980 that as long as the nuclear track holes on the surface of the sample meet certain conditions, the surface of the sample has the optical properties of anti-reflection and anti-reflection. ZL200612100299.X patent mentions a preparation method of anti-reflective materials. In the visible light region (400nm-800nm), the reflectance of the su...

Claims

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Application Information

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IPC IPC(8): B01D67/00
Inventor 王平生刘存兄张贵英孙洪超肖才锦倪邦发
Owner CHINA INSTITUTE OF ATOMIC ENERGY
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