Large-area high-density nuclear track nano-pore membrane, as well as equipment and method for preparing large-area high-density nuclear track nano-pore membrane

Abstract

The invention relates to equipment and method for preparing a large-area high-density nuclear track nano-pore membrane. The equipment comprises an etching generation device, wherein the etching generation device comprises a clamping part and a liquid holding part; the clamping part is used for clamping a latent track film and is fixed on the liquid holding part filled with etching liquid; an intermittent ultrasonic action is provided by utilizing an ultrasonic generator, and an etching product remained in track holes can be peeled in time; the latent track film is subjected to radiating sensitization by utilizing an ultraviolet lamp, and the etching speed is accelerated. According to the equipment and method, uniform etching of the film can be realized; the etching product is peeled by utilizing ultrasonic waves, so that the etching liquid and the latent track can be sufficiently contacted, and the etching speed of the track can be accelerated; the film is protected against the broken risk due to long-time vibration of the ultraviolet waves by adopting the intermittent ultrasonic action; and the track nano-porous film has excellent reflection resistance, and has wide application range due to the large area and high pore density.

Description

technical field [0001] The invention relates to the field of nuclear track pore membranes, in particular to a device, method and membrane for preparing large-area and high-density nuclear track nanoporous membranes. technical background [0002] Nuclear track membrane (belonging to solid nuclear track technology) has shown important application value in the fields of membrane separation, anti-counterfeiting technology, medicine and health care, electronics industry, and environmental science. In the 1980s, solid nuclear track technology was used for surface modification of materials. For example, it was mentioned in "Applied Optics" in 1980 that as long as the nuclear track holes on the surface of the sample meet certain conditions, the surface of the sample has the optical properties of anti-reflection and anti-reflection. ZL200612100299.X patent mentions a preparation method of anti-reflective materials. In the visible light region (400nm-800nm), the reflectance of the su...

AI Technical Summary

Problems solved by technology

ZL200612100299.X patent mentions a preparation method of anti-reflective materials. In the visible light region (400nm-800nm), the reflectance of the surface of the polyester nuclear track film sample treated by irradiation etching coating is higher than that of the sample without any treatment. The reflectivity of the material has been reduced by 98%. After years of research by Liu Cunxiong, etc., the materials developed have achieved a reflectivity of less than 1% in the visible-ultraviolet-mid-infrared band (400nm-25μm), but the samples currently developed are still limited to 2*2cm 2 Samples with a smaller area

[0003] Since the polymer film of the base material required for the preparation of anti-reflection materials is relatively thin (8 / cm 2 ), the film is easy to break after etching, so it is necessary to solve the problems of uniform etching, film fixation and peeling of etching products in the process of sample etching in order to obtain samples with large area and high track hole density

Images